Description
The OPTOMAN PP-UVFS-50.8-9.52-ULLM9 is a premium IBS-coated ultrafast laser mirror engineered for high-power femtosecond and picosecond laser systems operating around the 1030 nm wavelength. Manufactured on a precision UV fused silica substrate, this mirror combines exceptionally high reflectivity, low group delay dispersion (GDD), and outstanding laser-induced damage threshold (LIDT) to preserve ultrashort pulse quality while delivering long-term optical stability.
Designed for demanding industrial, scientific, and research environments, the mirror minimizes pulse distortion and optical losses, helping maximize laser efficiency in precision material processing, nonlinear optics, ultrafast spectroscopy, and advanced photonics applications. OPTOMAN's Ion Beam Sputtering (IBS) coating technology ensures dense, environmentally stable coatings with excellent durability and repeatable optical performance
PP-UVFS-50.8-9.52-ULLM9 Ultrafast Laser Mirror 1030 nm
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 500 – 530 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/4 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Lambda/8 |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD R @ AOI, @ Peak Wavelength: | 10 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM9 |
| FindLight SKU: | FL-24524 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM9
- Premium Ion Beam Sputtering (IBS) dielectric coating for superior durability and optical stability
- Optimized for ultrafast laser operation near 1030 nm
- Extremely high reflectivity to maximize optical throughput
- Low Group Delay Dispersion (GDD) helps preserve femtosecond and picosecond pulse duration
- High Laser-Induced Damage Threshold (LIDT) suitable for high-peak-power laser systems
- Precision UV fused silica substrate with excellent thermal and optical properties
- Low absorption and minimal scatter for improved beam quality
- Reliable long-term performance in industrial and research laser environments
- Ideal for OEM laser manufacturers, laboratories, and photonics system integrators
Applications
- Femtosecond laser systems
- Picosecond laser platforms
- Yb:YAG ultrafast laser beam delivery
- Precision laser micromachining
- Semiconductor manufacturing
- Ultrafast spectroscopy
- Nonlinear optical experiments
- Laser amplifier systems
- Optical research laboratories
- Scientific instrumentation
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the PP-UVFS-50.8-9.52-ULLM9 designed for?
Why is low GDD important for ultrafast lasers?
What advantages does IBS coating provide?
Which laser applications benefit most from this mirror?
Can this mirror be integrated into OEM laser systems?
Got more questions? Use the inquiry form to ask the supplier directly.
Similar Products
Your inquiry has been received.
Create an account by adding a password
Why create an account?
- Auto-complete inquiry forms
- View and manage all your past messages
- Save products to your favorites
- Close your account anytime — no hassle