Description

The OPTOMAN PP-UVFS-25.4-6.35-ULLM8 is a premium ultrafast laser mirror engineered for high-performance femtosecond and picosecond laser systems operating across the 1010–1050 nm spectral range. Manufactured on a precision UV fused silica (UVFS) substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this dielectric mirror delivers greater than 99.9% reflectivity, exceptionally low optical losses, and minimal group delay dispersion to preserve ultrashort laser pulses.

Designed for normal-incidence applications, the mirror combines excellent surface quality, high laser-induced damage threshold (LIDT), and outstanding environmental stability, making it an ideal choice for demanding industrial, scientific, and OEM laser systems. Its robust optical coating ensures reliable long-term performance even under high average power and high peak intensity laser operation.

PP-UVFS-25.4-6.35-ULLM8 Ultrafast Laser Mirror

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 15 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-ULLM8
FindLight SKU: FL-24527

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-ULLM8
  • Optimized for 1010–1050 nm near-infrared ultrafast laser applications
  • HR >99.9% reflectivity for maximum optical efficiency
  • Low Group Delay Dispersion (|GDD| <15 fs²) to preserve ultrashort pulse quality
  • Premium Ion Beam Sputtered (IBS) dielectric coating for excellent durability
  • UV fused silica substrate offering outstanding thermal and optical stability
  • High laser-induced damage threshold suitable for high-power femtosecond and picosecond lasers
  • Precision polished 25.4 mm diameter × 6.35 mm thickness
  • Surface quality 10-5 Scratch-Dig with λ/8 surface flatness
  • Designed for precision laser research, OEM integration, and industrial photonics applications

Applications

  • Yb:YAG ultrafast laser systems operating near 1030 nm
  • Femtosecond and picosecond laser beam steering
  • High-power laser beam delivery systems
  • Optical amplifier and regenerative amplifier setups
  • Nonlinear frequency conversion systems
  • Precision laser micromachining equipment
  • Scientific spectroscopy and laboratory research
  • Industrial laser processing and materials manufacturing
  • OEM laser system integration
  • Advanced photonics and optical instrumentation.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the PP-UVFS-25.4-6.35-ULLM8 designed for?
This mirror is optimized for high reflectivity across the 1010–1050 nm wavelength range, making it ideal for Yb-based ultrafast laser systems centered around 1030 nm.
Why is low group delay dispersion important in ultrafast lasers?
Low group delay dispersion helps maintain the temporal integrity of femtosecond and picosecond laser pulses, reducing pulse broadening and preserving peak power throughout the optical system.
What advantages does the IBS coating provide?
Ion Beam Sputtered coatings offer exceptional coating density, high environmental durability, extremely low optical absorption, excellent spectral stability, and high resistance to laser-induced damage, making them well suited for demanding ultrafast laser applications.
Can this mirror be used in high-power laser systems?
Yes. The combination of a UV fused silica substrate, high-reflectivity IBS coating, and high laser-induced damage threshold makes this mirror suitable for many high-power femtosecond and picosecond laser applications when operated within its specified limits.
What types of applications benefit most from this mirror?
The mirror is well suited for beam steering, laser cavities, optical amplifiers, nonlinear optics, precision laser processing, spectroscopy, research laboratories, and OEM ultrafast laser system integration where high reflectivity and pulse preservation are essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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