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Description

The OPTOMAN PP-UVFS-12.7-6.35-ULLM5SHL is a premium SuperHero Power ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications operating in the 1010–1050 nm spectral range. Manufactured on a UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this dielectric mirror delivers exceptional reflectivity, ultra-low group delay dispersion (GDD), and outstanding laser-induced damage threshold (LIDT) for high-energy Yb-based ultrafast laser systems.

Designed for a 45° angle of incidence, the mirror minimizes pulse distortion while maintaining beam quality during high-power beam steering. Compared to conventional ultrafast mirrors, the SuperHero Power coating offers significantly improved resistance to optical coating fatigue, enhanced lifetime under extreme peak intensities, and superior long-term stability in industrial and scientific laser environments. Its precision-polished optical surface, λ/8 flatness, and high-quality 10-5 scratch-dig finish make it an excellent choice for laser micromachining, nonlinear optics, biomedical instrumentation, and advanced photonics research.

PP-UVFS-12.7-6.35-ULLM5SHL SuperHero Power Ultrafast Laser Mirror

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Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-ULLM5SHL
FindLight SKU: FL-24523

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Features

  • SuperHero Power IBS dielectric coating optimized for 1010–1050 nm ultrafast laser operation.
  • High reflectivity exceeding 99.95% (s-polarization) and 99.9% (p-polarization) at 45° AOI.
  • Ultra-low Group Delay Dispersion (|GDD Rs| <10 fs², |GDD Rp| <20 fs²) to preserve ultrashort pulse duration.
  • Enhanced laser-induced damage threshold up to 5 J/cm² (1030 nm, 10 ps, s-polarization) for reliable high-power operation.
  • UV fused silica substrate with 12.7 mm diameter and 6.35 mm thickness for excellent thermal and mechanical stability.
  • Precision optical surface featuring λ/8 flatness, 10-5 scratch-dig quality, and <5 arcmin parallelism.
  • Ideal for beam steering in Yb:YAG femtosecond and picosecond laser systems.
  • Improved coating durability with reduced risk of color-change damage and longer operational lifetime.

Applications

  • High-power Yb:YAG ultrafast laser systems.
  • Femtosecond and picosecond laser beam delivery.
  • Precision laser micromachining and microfabrication.
  • Ultrafast laser materials processing.
  • Galvanometer scanning systems and laser beam steering modules.
  • Scientific spectroscopy and nonlinear optics experiments.
  • Pulse compression and dispersion-sensitive optical setups.
  • Biomedical laser instrumentation and advanced photonics research.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the PP-UVFS-12.7-6.35-ULLM5SHL designed for?
This mirror is optimized for ultrafast laser systems operating between 1010 nm and 1050 nm, making it particularly suitable for 1030 nm Yb-based femtosecond and picosecond lasers.
What makes the SuperHero Power version different from the standard ULLM5 mirror?
The SuperHero Power version features substantially higher measured laser-induced damage thresholds and improved coating durability while maintaining the same high reflectivity and ultra-low GDD characteristics. It is intended for more demanding high-peak-power applications.
Why is low Group Delay Dispersion important for ultrafast lasers?
Low GDD minimizes pulse broadening after reflection, helping preserve the original pulse duration and peak power. This is essential for applications requiring maximum precision, such as micromachining, nonlinear optics, and ultrafast spectroscopy.
Can this mirror be used in industrial laser processing systems?
Yes. Its high reflectivity, exceptional damage resistance, and durable IBS coating make it well suited for industrial ultrafast laser platforms used in precision cutting, drilling, engraving, and microfabrication.
What substrate material is used in this laser mirror?
The mirror is manufactured from high-quality UV fused silica, offering excellent optical homogeneity, low thermal expansion, and high resistance to laser-induced thermal effects, making it an ideal substrate for high-power ultrafast laser optics.

Got more questions? Use the inquiry form to ask the supplier directly.

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