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Description

The OPTOMAN PP-UVFS-50.8-9.52-ULLM5SHL-SSC is a premium SuperHero Series ultrafast laser mirror engineered for high-power Yb-based femtosecond and picosecond laser systems operating across the 1010–1050 nm wavelength range. Manufactured from high-quality UV fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers outstanding reflectivity, exceptionally low group delay dispersion (GDD), and industry-leading laser-induced damage threshold (LIDT) for demanding beam delivery applications.

Optimized for a 45° angle of incidence, the mirror maintains pulse integrity while efficiently steering high-energy ultrashort laser beams. Its stress-compensating rear coating enhances mechanical stability, while the SuperHero coating design minimizes absorption and eliminates color-change effects commonly associated with prolonged exposure to extreme laser intensities. This makes the mirror an excellent choice for industrial laser micromachining, scientific research, nonlinear optics, and advanced photonics systems where reliability and long-term performance are critical. Specifications include reflectivity exceeding 99.95% (s-polarization) and 99.9% (p-polarization) together with measured LIDT values up to 5 J/cm² for picosecond operation.

PP-UVFS-50.8-9.52-ULLM5SHL-SSC SuperHero Ultrafast Laser Mirror 1010–1050 nm

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Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-ULLM5SHL (SCC)
FindLight SKU: FL-24522

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM5SHL-SSC
  • Designed for ultrafast lasers operating from 1010–1050 nm
  • Premium SuperHero IBS dielectric coating for maximum durability
  • Reflectivity greater than 99.95% (s-pol) and 99.9% (p-pol) at 45° AOI
  • Ultra-low Group Delay Dispersion to preserve femtosecond and picosecond pulse duration
  • High measured laser-induced damage threshold up to 5 J/cm² for picosecond pulses
  • UV fused silica substrate with 50.8 mm diameter and 9.52 mm thickness
  • λ/8 transmitted wavefront flatness over the clear aperture
  • 20-10 scratch-dig surface quality for excellent optical performance
  • Stress-compensating backside coating improves coating stability and lifetime
  • Engineered to eliminate coating color-change effects under sustained high-power operation
  • Ideal for high-power beam steering in industrial and scientific laser systems

Applications

  • High-power femtosecond laser beam delivery
  • Picosecond laser processing systems
  • Precision laser micromachining
  • Semiconductor manufacturing equipment
  • Ultrafast laser material processing
  • Scientific laser laboratories
  • Nonlinear optics experiments
  • Optical beam steering assemblies
  • Laser scanning and galvo systems
  • Pulse compression and ultrafast optical setups
  • Yb:YAG laser platforms operating near 1030 nm

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

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Frequently Asked Questions

What lasers is the PP-UVFS-50.8-9.52-ULLM5SHL-SSC designed for?
This mirror is optimized for Yb-based ultrafast laser systems operating between 1010 and 1050 nm, making it suitable for many industrial and scientific femtosecond and picosecond laser platforms centered around 1030 nm.
Why is the SuperHero version different from a standard ultrafast mirror?
The SuperHero version features an enhanced IBS coating with significantly higher laser-induced damage thresholds, reduced absorption, improved coating durability, and resistance to color-change effects, allowing reliable operation at substantially higher peak powers.
How does low Group Delay Dispersion benefit ultrafast laser systems?
Low GDD minimizes pulse broadening during reflection, helping preserve ultrashort pulse duration and maintaining high processing precision and peak intensity throughout the optical system.
Can this mirror be used in industrial laser manufacturing equipment?
Yes. Its high reflectivity, excellent optical quality, and exceptional damage resistance make it well suited for laser micromachining, precision manufacturing, beam delivery systems, laser scanners, and other industrial ultrafast laser applications.
What are the main optical characteristics of this mirror?
The mirror features a 50.8 mm UV fused silica substrate, operates at a 45° angle of incidence, delivers reflectivity above 99.95% for s-polarized light and above 99.9% for p-polarized light, provides ultra-low GDD, and offers measured LIDT values up to 5 J/cm² for picosecond pulses, making it ideal for demanding high-energy ultrafast laser environments.

Got more questions? Use the inquiry form to ask the supplier directly.

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