Description
The OPTOMAN PP-UVFS-50.8-9.52-ULLM13 is a premium ion beam sputtered (IBS) ultrafast UV laser mirror engineered for demanding femtosecond and picosecond laser applications at 343 nm. Designed for operation at a 45° angle of incidence, this high-performance dielectric mirror combines exceptional reflectivity, near-zero group delay dispersion (GDD), and excellent laser-induced damage threshold (LIDT) to preserve pulse quality while maximizing optical efficiency.
Manufactured on a precision UV fused silica substrate, the mirror offers outstanding surface quality, high flatness, and long-term environmental stability. It is ideally suited for third-harmonic Yb:YAG laser systems used in industrial micromachining, precision material processing, scientific research, and advanced photonics applications where reliable UV beam steering is essential.
PP-UVFS-50.8-9.52-ULLM13 Ultrafast UV Laser Mirror 343 nm
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 320 – 370 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 0.17 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.5 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.75 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 10 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 10 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM13 |
| FindLight SKU: | FL-24516 |
Got questions about specs? Use the inquiry form to ask.
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Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM13
- Optimized for 343 nm third-harmonic ultrafast laser systems
- High reflectivity: HRp >99.5% (327–363 nm) and HRs >99.75% (320–370 nm) at 45° AOI
- Ultra-low Group Delay Dispersion (GDD): 0 ±10 fs² for minimal pulse broadening
- Ion Beam Sputtered (IBS) dielectric coating for excellent durability and spectral stability
- UV fused silica (JGS1) substrate for superior UV transmission and thermal stability
- Diameter: 50.8 mm; Thickness: 9.52 mm
- Surface flatness: λ/8 @ 633 nm over the clear aperture
- Surface quality: 20-10 scratch-dig
- Laser-Induced Damage Threshold: >0.1 J/cm² (100 fs, 343 nm)
- Ideal for femtosecond and picosecond UV laser beam steering
Applications
- Third-harmonic (343 nm) Yb:YAG ultrafast laser systems
- UV femtosecond laser beam delivery
- Precision laser micromachining
- Glass cutting and drilling
- Through-glass via (TGV) manufacturing
- Semiconductor and microelectronics processing
- Polymer micromachining
- Surface texturing and laser structuring
- Scientific laser laboratories
- Industrial photonics and OEM laser integration
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the PP-UVFS-50.8-9.52-ULLM13 designed for?
This mirror is optimized for third-harmonic ultrafast laser operation around 343 nm, providing exceptionally high reflectivity across approximately 320–370 nm while maintaining minimal pulse distortion.
Why is low Group Delay Dispersion (GDD) important?
Low GDD helps preserve the duration and shape of ultrashort laser pulses. This is essential in femtosecond and picosecond laser systems where pulse broadening can reduce machining precision and experimental accuracy.
What coating technology is used?
The mirror features an advanced Ion Beam Sputtered (IBS) dielectric coating. IBS technology produces dense, highly durable coatings with excellent environmental stability, superior optical performance, and outstanding long-term reliability.
Which laser systems can use this mirror?
The mirror is suitable for a wide range of third-harmonic Yb:YAG ultrafast laser platforms operating at 343 nm, making it an excellent choice for research laboratories, OEM laser manufacturers, and industrial laser processing equipment.
What applications benefit most from this mirror?
The PP-UVFS-50.8-9.52-ULLM13 is ideal for high-precision UV laser applications including microfabrication, glass processing, semiconductor manufacturing, polymer structuring, precision ablation, scientific experiments, and advanced photonics systems where high reflectivity, low dispersion, and excellent durability are critical.
Got more questions? Use the inquiry form to ask the supplier directly.
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