Description
he OPTOMAN PP-UVFS-50.8-9.52-ULLM19 (No SCC) is a premium ion beam sputtered (IBS) ultrafast laser mirror engineered for Yb-based femtosecond and picosecond laser systems operating at 1030 nm. Designed for reliable performance across a 0° to 45° angle of incidence, it combines greater than 99.9% reflectivity, low group delay dispersion (GDD), and excellent laser-induced damage threshold (LIDT) to preserve ultrashort pulse quality while enabling flexible optical system layouts.
Manufactured on a precision 50.8 mm UV fused silica substrate, this dielectric mirror delivers outstanding optical quality, low scatter, and stable long-term performance in demanding industrial, scientific, and research environments. Its wide-angle coating design allows system designers to steer laser beams without sacrificing reflectivity or pulse integrity, making it an excellent choice for advanced laser processing, nonlinear optics, microscopy, and ultrafast research applications.
PP-UVFS-50.8-9.52-ULLM19 (No SCC) 1030 nm Wide-Angle Ultrafast Laser Mirror
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 1030 – 1030 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 0 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/2 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Lambda/8 |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD R @ AOI, @ Peak Wavelength: | 30 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM19 (no SCC) |
| FindLight SKU: | FL-24521 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM19 (No SCC)
- Optimized for 1030 nm Yb-doped ultrafast laser systems.
- Wide operating angle of incidence from 0° to 45° for maximum optical design flexibility.
- HR reflectivity greater than 99.9% at 1030 nm.
- Low |GDD| below 30 fs² helps maintain femtosecond and picosecond pulse duration.
- Precision 50.8 mm diameter UV fused silica substrate with 9.52 mm thickness.
- Ion Beam Sputtered (IBS) dielectric coating for exceptional coating density, durability, and stability.
- High laser-induced damage threshold suitable for high-peak-power ultrafast lasers.
- 20-10 scratch-dig surface quality with precision flatness for excellent beam quality.
- Uncoated rear surface minimizes unwanted coating interactions where required.
- Ideal for demanding industrial, laboratory, and OEM laser integration.
Applications
- Beam steering in Yb:YAG, Yb:KGW, and Yb:KYW ultrafast laser systems
- Femtosecond and picosecond laser beam delivery
- Ultrafast laser micromachining and precision materials processing
- Nonlinear optics and frequency conversion setups
- Optical amplifier and regenerative amplifier systems
- Scientific laser laboratories and university research
- Multiphoton microscopy and advanced imaging systems
- Ultrafast spectroscopy
- OEM laser equipment integration
- High-power photonics and precision optical instruments
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
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Got more questions? Use the inquiry form to ask the supplier directly.
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