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Description

The OPTOMAN PP-UVFS-50.8-9.52-ULLM8 Ultrafast Laser Mirror is a precision dielectric mirror engineered for high-performance ultrafast laser applications in the 1010–1050 nm wavelength range. Manufactured with a UV fused silica substrate and an IBS high-reflectivity coating, this mirror provides excellent reflectance above 99.9% at 1030 nm while maintaining extremely low group delay dispersion to preserve the temporal characteristics of femtosecond and picosecond laser pulses.

Designed for 0° angle-of-incidence operation, the mirror delivers reliable performance in Yb-based ultrafast laser systems, pulse compression setups, and advanced optical research platforms. Its 50.8 mm diameter and 9.52 mm thickness make it suitable for demanding laboratory and industrial laser configurations requiring high optical quality, stability, and minimal pulse distortion.

PP-UVFS-50.8-9.52-ULLM8 Ultrafast Laser Mirror 1010-1050nm

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Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/2
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/8
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 15 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-ULLM8 (no SCC)
FindLight SKU: FL-24525

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Features

  • High Reflectivity IBS Coating: Provides greater than 99.9% reflectance from 1010–1050 nm for efficient ultrafast laser beam steering.
  • Low Group Delay Dispersion Design: Maintains pulse integrity with GDD reflection values below 15 fs², making it ideal for femtosecond and picosecond laser applications.
  • UV Fused Silica Substrate: Offers excellent thermal stability, optical transmission properties, and durability for precision laser systems.
  • High Optical Surface Quality: Features 20-10 scratch-dig surface quality and precision flatness specifications for demanding optical alignment requirements.
  • High Laser Damage Resistance: Designed to withstand high-intensity ultrafast laser pulses with tested damage threshold values suitable for advanced laser environments.
  • Large Clear Aperture Format: The 50.8 mm diameter configuration supports applications requiring larger beam handling capability.

Applications

  • Femtosecond Laser Systems — Beam steering and pulse-preserving reflection in ultrafast laser architectures.
  • Picosecond Laser Systems — Optical routing where low dispersion and high reflectivity are critical.
  • Yb:YAG Ultrafast Lasers — Compatible with 1030 nm fundamental wavelength laser platforms.
  • Pulse Compression Systems — Used in setups requiring minimized temporal pulse distortion.
  • Nonlinear Optics Research — Suitable for precision optical experiments involving high peak power laser pulses.
  • Industrial Ultrafast Laser Processing — Supports applications such as micromachining, material processing, and advanced manufacturing.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the OPTOMAN PP-UVFS-50.8-9.52-ULLM8 mirror designed for?
The mirror is optimized for ultrafast laser applications operating between 1010 nm and 1050 nm, including common 1030 nm Yb-based laser systems.
What type of coating does this ultrafast laser mirror use?
The mirror uses an IBS (ion beam sputtered) dielectric coating designed for high reflectivity and low dispersion performance in ultrafast laser applications.
Can this mirror be used with femtosecond lasers?
Yes. The PP-UVFS-50.8-9.52-ULLM8 is specifically designed for femtosecond and picosecond laser systems where maintaining short pulse duration and minimizing dispersion are important.
What substrate material is used for this optical mirror?
This mirror uses UV fused silica (UVFS), a material commonly selected for precision laser optics because of its excellent optical quality, thermal stability, and resistance to laser-induced effects.
Which laser systems are compatible with this mirror?
The mirror can be integrated into various Yb:YAG-based ultrafast laser platforms, including systems such as Light Conversion PHAROS and CARBIDE, Coherent Monaco, TRUMPF TruMicro, Spectra-Physics IceFyre FS, Amplitude Satsuma and Tangor, EKSPLA FemtoLux, and similar 1030 nm laser architectures.

Got more questions? Use the inquiry form to ask the supplier directly.

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