PP-UVFS-50.8-9.52-ULLM8 (SCC) Ultrafast Laser Mirror,

Name: PP-UVFS-50.8-9.52-ULLM8 (SCC) Ultrafast Laser Mirror,
Brand: Optoman
SKU: FL-24526
Price: 511.00 USD
Availability: InStock

Description

The OPTOMAN PP-UVFS-50.8-9.52-ULLM8 (SCC) is a high-performance ultrafast laser mirror designed for femtosecond and picosecond laser systems operating in the 1010–1050 nm wavelength range. Manufactured with a UV fused silica substrate and an advanced ion beam sputtered (IBS) coating, this optical mirror delivers greater than 99.9% reflectivity at 1030 nm while maintaining exceptionally low group delay dispersion (GDD) to preserve ultrashort pulse characteristics.

With a 50.8 mm diameter, 9.52 mm thickness, and stress compensating coating on the rear surface, this mirror provides reliable performance in demanding Yb-based ultrafast laser applications. Its high damage threshold, low optical loss, and precision surface quality make it suitable for beam steering, folding paths, and pulse-sensitive optical assemblies requiring maximum temporal accuracy.

Specifications

Diameter:	50.8 mm
Thickness:	9.52 mm
Wavelength Range:	1010 – 1050 nm
Clear Aperture (CA):	80 %
Substrate Material:	UV Grade Fused Silica
Angle Of Incidence (AOI):	0 – 0 deg
Surface Quality, S1 (scratch-dig):	20-10
Surface Quality, S2 (scratch-dig):	80-50
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer):	Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer):	Unspecified
Parallelism:	5 arcmin
S1 Surface:	Coated
S2 Surface:	Coated
Reflectivity (HRa @ AOI, @ Peak Wavelength):	99.9 %
GDD R @ AOI, @ Peak Wavelength:	15 fs^2
Manufacturer Part Number (MPN):	PP-UVFS-50.8-9.52-ULLM8 (SCC)
FindLight SKU:	FL-24526

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Features

Ultra-high reflectivity coating with HR >99.9% at 1010–1050 nm for efficient ultrafast laser beam delivery

Optimized for 1030 nm Yb:YAG ultrafast laser systems with 0° angle of incidence

Low group delay dispersion (|GDD R| <15 fs²) helps maintain femtosecond and picosecond pulse duration

UV fused silica substrate provides excellent thermal stability and optical performance

Ion beam sputtered (IBS) dielectric coating technology ensures durability and high laser damage resistance

Stress compensating coating (SCC) minimizes coating-induced deformation effects

Precision optical quality with 20-10 scratch-dig surface quality and λ/8 surface flatness

Designed for high-intensity ultrafast laser environments with measured LIDT capability for fs and ps pulses

Applications

Femtosecond and picosecond laser systems
Yb:YAG ultrafast laser platforms operating near 1030 nm
Laser cavity end mirrors and folding mirrors
Beam delivery systems for industrial ultrafast lasers
Multipass amplification and pulse manipulation setups
Precision optical modules requiring minimal dispersion effects
Research systems in nonlinear optics, micromachining, spectroscopy, and biomedical laser applications
Compatible with ultrafast laser platforms such as Light Conversion PHAROS/CARBIDE, Coherent Monaco, TRUMPF TruMicro, Spectra-Physics IceFyre FS, Amplitude Satsuma/Tangor, EKSPLA FemtoLux, and similar Yb-based systems

Export & Trade Information

ECCN:	EAR99
HTS Code:	9001.90.6000
Estimated US Tariff:	10%

Importing, tariffs & codes (Quick Guide) →

$511.00

Volume Pricing:

Qty	Unit Price	Extended Price
5	$485.45	$2,427.25
10	$434.35	$4,343.50

Discounts apply automatically in cart.

Shipping:: $75.00 ⓘ
Ships from:: Lithuania
Est. US Tariff:: $51.10 ⓘ
Processing:: 1 days (Est. arrival by Nov 6)
Delivers to:: United States

Made by:: Optoman
Made in:: Lithuania
Warranty:: View full terms
Returns:: View return policy
Sold by:: Optoman
On FindLight:: since 2026

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Frequently Asked Questions

What wavelength range is the OPTOMAN PP-UVFS-50.8-9.52-ULLM8 (SCC) mirror designed for?

This ultrafast laser mirror is optimized for operation from 1010 nm to 1050 nm, including the commonly used 1030 nm wavelength of Yb:YAG femtosecond and picosecond laser systems.

What makes this mirror suitable for ultrafast laser applications?

The mirror features an IBS high-reflectivity coating with low group delay dispersion, allowing it to reflect ultrashort laser pulses while minimizing temporal distortion. This helps preserve pulse duration and beam quality in demanding femtosecond and picosecond systems.

What is the reflectivity performance of this OPTOMAN laser mirror?

The mirror provides HR >99.9% reflectivity between 1010 nm and 1050 nm at normal incidence, enabling efficient laser beam handling with minimal optical losses.

What substrate material is used for this ultrafast mirror?

The PP-UVFS-50.8-9.52-ULLM8 (SCC) uses UV fused silica (UVFS) as the substrate material. This material offers excellent optical transmission properties, low thermal expansion, and high stability for precision laser applications.

Which laser systems can use this OPTOMAN ultrafast mirror?

This mirror is suitable for many Yb-based ultrafast laser platforms, including systems from Light Conversion, Coherent, Lumentum, TRUMPF, Spectra-Physics, Amplitude, EKSPLA, Thorlabs, Fluence Technology, and Photonics Industries.

Got more questions? Use the inquiry form to ask the supplier directly.