Description
The OPTOMAN PP-UVFS-50.8-9.52-BBHR51 is a premium broadband ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications. Manufactured on a precision UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, it delivers exceptionally high reflectivity with low group delay dispersion (GDD) across a broad spectral range, helping preserve ultrashort pulse integrity while minimizing optical losses.
Designed for operation at a 45° angle of incidence, this broadband mirror provides Rp >99.9% from 730–870 nm and Rs >99.9% from 700–920 nm, making it an excellent choice for Ti:Sapphire laser systems, tunable ultrafast sources, nonlinear optics, spectroscopy, and advanced photonics research. Its durable IBS coating offers excellent environmental stability, high laser damage resistance, and long-term performance in both laboratory and industrial environments.
PP-UVFS-50.8-9.52-BBHR51 Broadband Ultrafast Laser Mirror 700–920 nm
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 700 – 920 nm |
| Clear Aperture (CA): | 90 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/10 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.9 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.9 % |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-BBHR51 |
| FindLight SKU: | FL-24494 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-BBHR51
- Broadband ultrafast mirror optimized for 700–920 nm
- High reflectivity: Rp >99.9% (730–870 nm) and Rs >99.9% (700–920 nm)
- Optimized for 45° angle of incidence
- Low group delay dispersion for ultrashort pulse preservation
- Precision UV fused silica substrate
- Ion Beam Sputtered (IBS) dielectric coating for superior durability
- 50.8 mm diameter with 9.52 mm thickness
- Surface flatness better than λ/10 @ 633 nm
- Surface quality 20-10 scratch-dig
- Clear aperture greater than 90%
- Excellent resistance to humidity, temperature variations, and mechanical wear
Applications
- Ti:Sapphire femtosecond laser systems
- Picosecond laser platforms
- Tunable ultrafast laser sources
- Pump-probe spectroscopy
- Multiphoton microscopy
- Nonlinear optics experiments
- Optical parametric amplifier (OPA) systems
- Laser beam steering and routing
- Ultrafast scientific research
- Precision photonics instrumentation
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What laser wavelength range is this mirror designed for?
Why is low group delay dispersion important?
What coating technology is used on this mirror?
Is this mirror intended for a specific angle of incidence?
Which laser systems commonly use this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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