SID4 XHR High Resolution Phase Sensor 400-1100nm Compact Plug and Play

Specifications

Wavelength Range: 400 – 1100 nm
# Pixels (Width): 1400
# Pixels (Height): 1000
Lenslet Pitch: 27.6 um
Wavefront Accuracy: Unspecified
Type: Lateral Shearing
Aperture Dimension: 38.64 x 27.60 mm²
Phase Sampling: 1400 x 1000
Spatial Resolution: 27.6 µm
Phase Resolution: 6 nm RMS
Dimensions: 114 x 105 x 110 mm
Weight: ~1 kg

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Features

  • Ultra-High Resolution Phase Imaging: Achieve exceptional phase sampling of 1400 x 1000 with a phase resolution of 6 nm RMS for precise optical measurements.
  • Large Sensor Aperture: Features a generous 38.64 x 27.60 mm² aperture, enabling wide field-of-view and high sensitivity for diverse applications.
  • Broad Wavelength Range: Operates efficiently across 400 – 1100 nm, covering visible to near-infrared spectral regions for versatile use.
  • Compact & Lightweight Design: Space-saving dimensions (114 x 105 x 110 mm) and lightweight (~1 kg) construction make it ideal for integration into laboratory and industrial setups.
  • High Spatial Resolution: Delivers a spatial resolution of 27.6 µm, ensuring detailed and accurate imaging of fine structures.
  • Plug and Play Operation: User-friendly setup with minimal configuration required, allowing for quick deployment and ease of use.
  • Robust & Reliable: Engineered for stability and consistent performance in demanding environments.
  • Versatile Applications: Perfect for quantitative phase imaging, wavefront sensing, laser beam characterization, and optical metrology.
  • Trusted Manufacturer: Developed by PHASICS, a global leader in advanced optical instrumentation.

Applications

  • Laser Beam Characterization: Accurately measure and analyze laser beam profiles, wavefronts, and phase distortions for research, development, and quality control in optics and photonics.
  • Optical Component Testing: Evaluate the quality and performance of lenses, mirrors, and other optical components by detecting aberrations and surface defects with high spatial and phase resolution.
  • Microscopy and Bio-Imaging: Enhance quantitative phase imaging in biological and medical research, enabling label-free cell analysis, tissue imaging, and live cell monitoring.
  • Semiconductor Inspection: Perform non-contact, high-resolution inspection of wafers and photomasks to detect sub-micron defects and ensure process quality in semiconductor manufacturing.
  • Adaptive Optics: Integrate into adaptive optics systems for real-time correction of wavefront distortions in astronomy, laser communication, and ophthalmology.
  • Metrology and Surface Profiling: Conduct precise surface topography measurements for industrial metrology, MEMS characterization, and quality assurance of precision surfaces.
  • Laser System Alignment: Facilitate rapid and accurate alignment of complex laser systems and optical setups, reducing setup time and improving performance.
  • Material Science Research: Investigate material properties, stress, and deformation by mapping phase variations across samples in materials research and engineering.
  • Optical System Development: Support the design, testing, and optimization of advanced optical systems, including telescopes, microscopes, and imaging devices.
  • Educational and Training Purposes: Serve as a powerful teaching tool for demonstrating principles of wavefront sensing, phase imaging, and optical metrology in academic settings.