SID4 SWIR HR High Resolution SWIR Wavefront Sensor 0.9-1.7µm

Key Features of the SID4 SWIR HR Wavefront Sensor

• High-resolution SWIR wavefront sensor designed for precise wavefront measurement and optical testing in the 900 nm to 1.7 µm short-wave infrared range.
• Integrated InGaAs detector delivers high sensitivity for accurate SWIR phase and intensity analysis across demanding infrared applications.
• Ultra-high spatial resolution with 160 x 128 phase pixels, enabling detailed characterization of SWIR lenses, optical assemblies, and infrared imaging systems.
• 60 µm phase spatial resolution supports fine wavefront mapping for advanced optical metrology and alignment tasks.
• Excellent phase measurement precision with phase resolution of < 2 nm RMS for highly accurate optical performance evaluation.
• 15 nm RMS absolute accuracy provides reliable and repeatable wavefront measurement results for laboratory, production, and R&D environments.
• Wide measurement aperture of 9.60 x 7.68 mm² accommodates a broad range of SWIR optical components and beam sizes.
• Fast image acquisition up to 30 fps enables efficient testing, monitoring, and dynamic wavefront analysis.
• Real-time processing above 7 fps at full resolution when used with PhaseStudio software, supporting rapid feedback during optical alignment and system optimization.
• Patented Phasics wavefront sensing technology provides robust, accurate, and vibration-insensitive wavefront measurements without requiring complex interferometric alignment.
• Simultaneous phase and intensity measurement allows complete optical beam characterization in a single compact instrument.
• Optimized for SWIR lens testing in optical communications, free-space optical communication systems, inspection instruments, night vision, military imaging, and surveillance devices.
• Ideal for optical components and assemblies, including SWIR objectives, infrared lenses, collimators, beam expanders, laser systems, and imaging modules.
• Gigabit Ethernet interface ensures reliable data transfer and straightforward integration into automated test benches and industrial inspection platforms.
• Compact and lightweight design with dimensions of approximately 58 x 65 x 95 mm and weight of about 500 g, making it suitable for benchtop, embedded, and production-line use.
• Suitable for advanced application areas including automotive sensing, aerospace optics, FSOC, defense, surveillance, optical metrology, and SWIR imaging system qualification.
• Reliable solution for high-precision infrared optical testing, combining high sensitivity, high spatial sampling, fast acquisition, and accurate phase reconstruction in the SWIR spectral band.

• SWIR lens testing and qualification: High-resolution wavefront measurement of short-wave infrared lenses operating from 900 nm to 1.7 µm.
• Optical communications component testing: Characterization of lenses, collimators, fiber-coupling optics, and beam delivery assemblies used at telecom wavelengths such as 1310 nm and 1550 nm.
• Free-space optical communication systems: Beam quality analysis, wavefront alignment, and optical path optimization for FSOC transmitters, receivers, and tracking systems.
• Automotive LiDAR optics: Testing and alignment of SWIR and near-infrared optical assemblies used in automotive LiDAR, ADAS sensing, and autonomous vehicle vision systems.
• Night vision and surveillance systems: Wavefront inspection of SWIR imaging lenses and optical modules for low-light, night vision, perimeter security, and long-range surveillance devices.
• Aerospace optical systems: Metrology and alignment of compact SWIR optical assemblies used in airborne imaging, spaceborne sensing, satellite payloads, and optical navigation systems.
• Defense and military infrared optics: Quality control of SWIR lenses, targeting optics, reconnaissance systems, and infrared imaging components for demanding defense applications.
• High-resolution optical component inspection: Measurement of transmitted wavefront error, aberrations, optical flatness, and assembly-induced defects in lenses, windows, filters, prisms, and beam splitters.
• SWIR camera and imaging system calibration: Optical alignment and performance verification of InGaAs-based cameras, inspection instruments, and SWIR imaging modules.
• Laser beam wavefront characterization: Analysis of near-infrared and SWIR laser sources, including 940 nm, 1064 nm, 1310 nm, and 1550 nm laser diodes, VCSELs, and fiber lasers.
• Adaptive optics development: Real-time wavefront sensing for deformable mirror control, optical correction, and closed-loop adaptive optics systems in the SWIR range.
• Fiber optics and photonics R&D: Characterization of beam collimation, fiber output wavefronts, coupling optics, and photonic device performance in laboratory and production environments.
• Semiconductor and industrial inspection optics: Wavefront testing of SWIR inspection instruments used for wafer inspection, material sorting, silicon imaging, and non-destructive evaluation.
• Laser manufacturing and alignment: Optical setup verification, beam path optimization, and quality control for laser processing systems using near-infrared and SWIR wavelengths.
• Metrology of compact optical assemblies: Production-line testing of miniaturized lens modules and precision optical assemblies where high spatial resolution and sensitivity are required.
• Scientific instrumentation: Integration into experimental setups requiring accurate SWIR wavefront measurement, phase mapping, and intensity sampling for advanced optical research.
• Telescope and remote sensing optics: Alignment and aberration measurement of SWIR optical paths used in remote sensing, atmospheric monitoring, and astronomical instrumentation.
• Biomedical and life science imaging optics: Testing of near-infrared and SWIR imaging lenses used in advanced microscopy, tissue imaging, fluorescence imaging, and diagnostic instrumentation.
• Quality assurance for infrared optical manufacturing: Incoming inspection, final validation, and repeatable production testing of SWIR optical components and assemblies.
• Wavefront metrology for 900 nm to 1.7 µm systems: Precise phase and intensity measurement for any optical system operating across the near-infrared and short-wave infrared spectral range.