Phasics SID4 HR High Resolution Wavefront Sensor 400-1100 nm

Specifications

Wavelength Range: 400 – 1100 nm
# Pixels (Width): 360
# Pixels (Height): 416
Lenslet Pitch: 24 um
Wavefront Accuracy: <= lambda/30
Type: Lateral Shearing
Wavelength Range: 400 - 1100 nm
Aperture Dimensions: 9.98 x 8.64 mm²
Phase Spatial Resolution: 24 µm
Phase And Intensity Sampling: 416 x 360
Resolution (Phase): <2 nm RMS
Accuracy (Absolute): 20 nm RMS
Dynamic Range: 500 µm PV
Frame Rate: 10 fps
Real-time Processing Frequency: 3 fps (full resolution)
Interface: Giga Ethernet
Dimensions: 73 x 71 x 90 mm
Weight: ~450 g

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Features

  • Very High Resolution Wavefront Sensor: SID4 HR delivers dense 416 x 360 phase and intensity sampling, making it ideal for demanding optical metrology, beam diagnostics, and wavefront analysis applications.
  • Large Aperture for Direct Beam Measurement: Features a 9.98 x 8.64 mm² aperture, enabling direct measurement of large or highly diverging beams without the need for relay optics.
  • High Dynamic Range Performance: Supports an extreme 500 µm PV wavefront dynamic range, allowing reliable measurement of highly aberrated wavefronts and complex optical systems.
  • Exceptional Wavefront Sensitivity: Provides <2 nm RMS phase resolution for precise detection of small optical aberrations, surface errors, and beam quality variations.
  • High Absolute Measurement Accuracy: Offers 20 nm RMS absolute accuracy, supporting dependable quantitative wavefront measurement in laboratory, industrial, and research environments.
  • Broad Visible to Near-Infrared Compatibility: Operates across a 400–1100 nm wavelength range, suitable for visible and NIR laser systems, optical components, imaging modules, and photonics testing.
  • Fine Phase Spatial Resolution: Achieves 24 µm phase spatial resolution, enabling detailed characterization of local wavefront defects and high-resolution optical performance mapping.
  • Real-Time Wavefront Analysis: Supports acquisition up to 10 fps and 3 fps full-resolution real-time processing with PhaseStudio software for efficient alignment, diagnostics, and live system optimization.
  • Optimized for Large Diverging Beams: The combination of high sampling density, large aperture, and high dynamic range makes SID4 HR especially suited for direct measurement of diverging beams in advanced optical setups.
  • Ideal for Defense and Aerospace Optics: Designed for precision wavefront sensing in defense, directed energy, laser beam control, telescope alignment, and high-performance optical assemblies.
  • Advanced Astronomy Wavefront Measurement: Well suited for astronomical instrumentation, telescope optics, adaptive optics development, and large-aperture optical testing.
  • Reliable Optical Component Inspection: Enables accurate testing of lenses, mirrors, objectives, optical assemblies, freeform optics, and imaging systems during R&D, production, and quality control.
  • AR/VR and Display Optics Testing: Supports characterization of AR/VR lenses, waveguides, near-eye display optics, and compact imaging modules where high spatial resolution and wavefront accuracy are critical.
  • High-Speed Data Connectivity: Equipped with a Gigabit Ethernet interface for stable data transfer and integration into automated optical metrology systems.
  • Compact and Lightweight Design: Measures 73 x 71 x 90 mm and weighs approximately 450 g, allowing easy integration into optical benches, production tools, and portable measurement platforms.
  • Professional Wavefront Metrology Solution: Built for users who need a high-resolution wavefront sensor with large-aperture measurement capability, nanometer-level sensitivity, and robust performance for advanced photonics applications.

Applications

  • High-resolution wavefront measurement: Precision measurement of optical wavefront error, phase maps, aberrations, and beam quality for demanding optical metrology applications.
  • Large diverging beam characterization: Direct wavefront sensing of large divergent beams without relay optics, ideal for high numerical aperture sources and compact optical setups.
  • Defense and aerospace optical systems: Testing and alignment of targeting optics, surveillance systems, directed-energy systems, laser rangefinders, beam directors, and free-space optical communication terminals.
  • Astronomy and adaptive optics: Wavefront analysis for telescope alignment, adaptive optics calibration, atmospheric turbulence studies, mirror testing, and astronomical instrumentation development.
  • Laser beam diagnostics: Measurement of laser wavefront, beam quality, phase distortion, divergence, collimation, astigmatism, coma, and other aberrations in visible and near-infrared laser systems.
  • High-power laser system alignment: Optimization of beam delivery optics, beam expanders, collimators, focusing assemblies, and high-energy laser optical trains.
  • Optical component testing: Quality control and R&D testing of lenses, mirrors, prisms, windows, filters, beam splitters, diffractive optics, and freeform optical components.
  • Optical assemblies and module alignment: Verification of complete optical systems including imaging lenses, relay optics, microscope objectives, camera modules, projection optics, and sensor assemblies.
  • AR/VR and mixed reality optics: Characterization of waveguides, micro-displays, projection modules, combiners, pancake optics, near-eye display optics, and compact imaging systems.
  • Lens and objective metrology: Measurement of transmitted wavefront error, spherical aberration, field-dependent aberrations, optical axis alignment, and manufacturing defects in precision lenses.
  • Freeform optics inspection: Phase and intensity measurement for non-standard optical surfaces used in advanced imaging, illumination, aerospace, AR/VR, and compact optical designs.
  • Collimation and focus optimization: Real-time adjustment of collimators, fiber-coupled sources, laser diodes, beam expanders, and focusing optics using high-sensitivity wavefront feedback.
  • Interferometry support and optical metrology: Complementary wavefront sensing for interferometric testing, alignment verification, surface error analysis, and optical system qualification.
  • Manufacturing quality control: Production-line inspection of optical components and assemblies where high spatial sampling, repeatable measurements, and fast wavefront analysis are required.
  • Research and laboratory instrumentation: Advanced wavefront analysis for university, government, and industrial laboratories working on photonics, imaging, laser physics, and precision optics.
  • Microscopy and biomedical optics: Wavefront measurement and aberration correction for microscope objectives, fluorescence imaging systems, ophthalmic instruments, endoscopy optics, and adaptive microscopy.
  • Semiconductor and lithography optics: Testing of high-precision optical subsystems, illumination optics, inspection tools, and beam conditioning modules used in semiconductor manufacturing equipment.
  • LiDAR and 3D sensing systems: Characterization of transmitter and receiver optics, beam shaping elements, scanning optics, and wavefront quality in LiDAR and time-of-flight sensing platforms.
  • Free-space optical communications: Alignment and wavefront optimization of optical transmitters, receivers, collimators, and beam steering systems for high-performance optical links.
  • Optical system prototyping: Rapid evaluation of aberrations, alignment errors, and phase distortions during development of custom optical systems and photonic instruments.