Plasma Sources

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Plasma Sources

The EQ-10HR is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HR high repetition rate EUV source is uniquely suited for metrology and research applications where simulation of high volume ...

Specifications

Central Wavelength: 13.5 nm
Spectral Bandwidth: 0.27 nm
EUV Output Power (2pi Steradian): 20 W
Pulse Repetition Rate: 1000-10000Hz
Data Sheet
The EQ-10HP is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HP EUV source is uniquely suited for metrology and research applications. The EQ-10 series sources have become the workhorse EUV ...

Specifications

Central Wavelength: -- nm
Spectral Bandwidth: -- nm
EUV Output Power (2pi Steradian): 20 W
Pulse Repetition Rate: 1200-2500Hz
Data Sheet
The Laser-Driven Tunable Light Source (LDTLS™) is a compact, fully integrated and highly stable tunable broadband light source that is based on our proven Laser-Driven Light Source (LDLS™) technology. The LDTLS™ utilizes our EQ-77 LDLS™ broadband source and features the highest ...

Specifications

Spectral Output: 300-1100nm
Numerical Aperture: 0.39
Typical Bulb Life: >9000 hrs
Data Sheet
Based on the highly successful Laser-Driven Light Source (LDLS ™) technology, the EQ-400 offers the highest radiance and irradiance available in a truly broadband white light source. The EQ-400 features a compact lamp house, with clean construction that ensures long life and ultimate stability. With a ...

Specifications

Spectral Output: 170-2100nm
Numerical Aperture: 0.50
Typical Bulb Life: >9000 hrs
Data Sheet
Traditional calibration sources for radiometric calibration, such as Deuterium, Quartz Tungsten Halogen, and Xenonarc, all have limitations in spectral range. No one source covers the full UV-Visible range from 200nm-800nm with output at comparable levels across that spectrum. In addition, traditional sources ...

Specifications

Spectral Output: 200-800nm
Numerical Aperture: 0.47
Typical Bulb Life: >9000 hrs
Data Sheet
Advanced imaging and analytical spectroscopy applications in the life sciences and materials sciences need light sources capable of providing extremely high brightness across broad wavelength range. Traditionally, multiple lamps (Tungsten/Halogen, Xenon-arc, Deuterium) have been used to cover this ...

Specifications

Spectral Output: 170-2100nm
Numerical Aperture: 0.47
Typical Bulb Life: >9000 hrs
Data Sheet
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective light source, based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications. The EQ-10 has become the workhorse EUV source for the EUV community, through its proven ...

Specifications

Central Wavelength: 13.5 nm
Spectral Bandwidth: .27 nm
EUV Output Power (2pi Steradian): 10 W
Pulse Repetition Rate: 1200-2000Hz
Data Sheet
Energetiq has developed a revolutionary single-light source technology called the LDLS™ Laser-Driven Light Source that enables extreme high brightness with a relatively flat spectrum, from deep ultraviolet through visible into the near infrared, combined with life-time an order of magnitude longer than traditional lamps. The LDLS ...

Specifications

Spectral Output: 170-2100nm
Numerical Aperture: .22
Typical Bulb Life: >9000 hrs
Data Sheet
Based on the highly successful Laser-Driven Light Source(LDLS) technology, the EQ-77 offers the highest radiance and irradiance available in a truly broadband white light source. The EQ-77 features a compact lamp house, with clean construction that ensures long life and ultimate stability. With a 170nm-2100nm wavelength range and a ...

Specifications

Spectral Output: 170-2100nm
Numerical Aperture: Up to .50
Typical Bulb Life: >9000 hrs
Data Sheet

Frequently Asked Questions

A plasma source is a device that produces plasma, which is a state of matter consisting of ionized gas particles.

There are many different types of plasma sources, including capacitively coupled plasma sources, microwave plasma sources, inductively coupled plasma sources, and more.

Plasma sources are used in a wide range of applications, including surface treatment, material processing, plasma etching, and plasma deposition, among others.

Plasma sources can offer high processing rates, precise control over the plasma properties, and the ability to process a wide range of materials.

The choice of plasma source will depend on a variety of factors, including the specific application, the desired plasma properties, and the materials being processed.

When using a plasma source, it is important to consider factors such as the power input, gas flow rate, gas composition, and pressure, as well as any specific requirements of the materials being processed.

Plasma sources are important components in plasma processing and surface treatment applications. At FindLight, we offer a wide selection of high-performance plasma sources, including capacitively coupled plasma sources, microwave plasma sources, and inductively coupled plasma sources, among others. Our product catalog includes options from leading manufacturers, with detailed specifications and expert support available to help you find the right plasma source for your application. Browse our selection today to discover the best plasma sources for your needs.

Did You know?

Plasma sources are essential components in a wide range of plasma processing and surface treatment applications. These sources produce plasma, which is a state of matter consisting of ionized gas particles, by applying a combination of high frequency power and gas flow to a chamber. There are various types of plasma sources, including capacitively coupled plasma sources, microwave plasma sources, and inductively coupled plasma sources, each with unique characteristics and advantages. Capacitively coupled plasma sources are commonly used for surface treatment and material processing applications, while microwave plasma sources are ideal for plasma deposition and etching. Inductively coupled plasma sources offer high-density plasmas with excellent uniformity and can process a wide range of materials. The choice of plasma source will depend on various factors such as the specific application, desired plasma properties, and materials being processed. With our extensive catalog of plasma sources, FindLight is your go-to source for finding the right plasma source for your needs.