Plasma Sources
Frequently Asked Questions
A plasma source is a device that produces plasma, which is a state of matter consisting of ionized gas particles.
There are many different types of plasma sources, including capacitively coupled plasma sources, microwave plasma sources, inductively coupled plasma sources, and more.
Plasma sources are used in a wide range of applications, including surface treatment, material processing, plasma etching, and plasma deposition, among others.
Plasma sources can offer high processing rates, precise control over the plasma properties, and the ability to process a wide range of materials.
The choice of plasma source will depend on a variety of factors, including the specific application, the desired plasma properties, and the materials being processed.
When using a plasma source, it is important to consider factors such as the power input, gas flow rate, gas composition, and pressure, as well as any specific requirements of the materials being processed.
Plasma sources are important components in plasma processing and surface treatment applications. At FindLight, we offer a wide selection of high-performance plasma sources, including capacitively coupled plasma sources, microwave plasma sources, and inductively coupled plasma sources, among others. Our product catalog includes options from leading manufacturers, with detailed specifications and expert support available to help you find the right plasma source for your application. Browse our selection today to discover the best plasma sources for your needs.