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Plasma, considered the fourth state of matter, is a hot ionized medium consisting of roughly equal amounts of positively and negatively charged particles. As plasma is highly influenced by magnetic and electric fields, plasma light sources utilize the properties of plasma to produce extremely high-power light. One of the main applications of plasma light sources is for extreme ultraviolet (EUV) photolithography for semiconductor chip manufacturing. Because EUV uses a greatly reduced wavelength, it enables smaller and more precise features on silicon surface wafers than optical lithography.