Description
The EQ-10HR is a state-of-the-art EUV light source designed to meet the rigorous demands of modern metrology and research applications. Utilizing Energetiq’s innovative Electrodeless Z-Pinch™ technology, this compact and efficient system leverages Xenon gas to deliver a high repetition rate of 10 kHz. This makes the EQ-10HR an ideal solution for environments where simulating high volume manufacturing is crucial.
As a stand-alone system, the EQ-10HR is engineered for seamless integration into process tools. It encompasses a comprehensive suite of components, including the electrodeless Z-pinch source assembly, a maglev vacuum pumping subsystem, a gas delivery subsystem, a power delivery subsystem, and advanced control electronics. This integrated approach ensures that the EQ-10HR not only meets performance expectations but also maintains ease of use and reliability.
Energetiq Technology, Inc. has a long-standing reputation for developing advanced light sources that support the analysis and manufacture of nano-scale structures. The EQ-10HR embodies this legacy by combining cutting-edge plasma physics with robust industrial design, ensuring that it delivers high-brightness EUV light consistently and reliably. This commitment to quality and innovation positions the EQ-10HR as a cost-effective and dependable choice for researchers and manufacturers alike.
EQ-10HR High Repetition Rate EUV Light Source
Specifications
| Central Wavelength: | 13.5 nm |
|---|---|
| Spectral Bandwidth: | 0.27 nm |
| EUV Output Power (2pi Steradian): | 20 W |
| Pulse Repetition Rate: | 1000 – 10000 Hz |
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Features
- High Repetition Rate EUV Light Source: The EQ-10HR features Energetiq's Electrodeless Z-Pinch™ technology, providing a 10 kHz pulse rate for efficient EUV emission.
- Compact and Reliable Design: Built as a stand-alone system, the EQ-10HR is easy to integrate into existing process tools, featuring a small footprint and low maintenance requirements.
- Low Cost of Ownership: The system is designed with a low Xenon flow rate and minimized consumable costs, making it a cost-effective solution for high volume manufacturing (HVM) simulations.
- Proven Reliability: Utilizing patented Electrodeless Z-Pinch™ technology, the EQ-10HR is CE Mark and SEMI S2-0703 compliant, ensuring high standards of safety and reliability.
- Versatile Applications: Ideal for accelerated EUV optics testing, EUV metrology, EUV resist development, defect inspection, and EUV microscopy.
- Advanced EUV Performance: Operates at a typical source pressure of 150 mTorr with a Xenon flow rate of 100 sccm, ensuring optimal performance.
Applications
- High Repetition Rate: Delivers a stable 10 kHz pulse rate for efficient EUV generation.
- Electrodeless Z-Pinch™ Technology: Patented design avoids electrodes, reducing debris and heat load.
- Compact and Cost-Effective: Small footprint with minimized consumable costs for operational efficiency.
- Reliable Performance: Proven stability with excellent spatial and power output consistency.
- Integrated Subsystems: Includes source assembly, maglev vacuum pump, gas delivery, power delivery, and control electronics.
- Regulatory Compliance: CE Mark and SEMI S2-0703 certified for global standards adherence.
Frequently Asked Questions
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