The EQ-10HP is an advanced EUV light source crafted by Energetiq, renowned for its compact design and ease of use. This high-power device utilizes the innovative Electrodeless Z-Pinch™ technology, employing Xenon gas to deliver exceptional performance. It stands out as a reliable and cost-effective solution, making it a preferred choice for the EUV community. Its robust design and low operational costs make it an ideal tool for metrology and research applications, where precision and reliability are paramount.

Building on the successful foundation of Energetiq’s EQ-10 series, the EQ-10HP offers significant enhancements in power and brightness. It operates at higher input powers, providing double the EUV output compared to its predecessors. This increased efficiency is particularly beneficial for imaging applications, such as EUV mask inspection, where clarity and detail are critical. The EQ-10HP’s superior performance ensures it meets the demanding needs of advanced technological environments.

The modular design of the EQ-10HP allows seamless integration into various process tools. It includes essential components like the Electrodeless Z-Pinch™ source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics. Capable of delivering up to 20 Watts of in-band EUV into 2π steradians, the EQ-10HP operates continuously at pulse repetition rates of up to 2.5 kHz. This flexibility and power make it a versatile tool for a range of scientific and industrial applications.

Energetiq’s Electrodeless Z-Pinch™ technology is a standout feature, offering a unique approach to generating EUV light. Unlike traditional methods that use electrodes, Energetiq’s technology inductively couples the current into the plasma, avoiding direct contact with high-temperature plasma. This method significantly reduces debris and minimizes heat load, enhancing the system’s longevity and performance. The spatial stability and consistent power output of this technology ensure reliable results, reinforcing the EQ-10HP as a leading choice for EUV light sources.