AONano 266-1.5W-6K ND:YAG DUV Laser

Specifications

Avg. Power: 1.5 W
Wavelength: 266 nm
Repetition Rate: 1 – 50 kHz
Spatial Mode (M^2): 1.2
Pulse Duration: 20 ns
Pulse-to-Pulse Stability (RMS): 2 %
Cooling: Air
Average Power: 0.5W to 3W
Spatial Mode: TEM00
Beam Roundness: >90%
Pulse Width (ns): <30ns @1kHz to <50ns @10kHz
Pulse Energy (mJ @ 1kHz): >0.1mJ to >1.2mJ
Polarization Ratio: >100:1 LINEAR, HORIZONTAL
Communication Protocol: RS-232
Operating Voltage (VAC): 90-260
Line Frequency (Hz): 47-63
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Features


  • Innovative End-Pumping Technology: Enhances laser performance and efficiency.

  • Air-Cooling System: Supports average power up to 6W, ensuring optimal operation without the need for complex cooling systems.

  • Excellent Beam Quality: Provides superior pulse stability and point stability for precision applications.

  • Patent Pending Harmonic Conversion Technologies: Delivers advanced laser capabilities and performance.

  • Ultra-Compact & Light-Weight Design: Facilitates easy integration and handling.

  • Brand-New Focusing Optics: Ensures precise and accurate laser focusing.

  • Field-Replaceable Diode: Allows for quick and easy maintenance, minimizing downtime.

  • 24/7 Proven Reliability: Engineered for continuous operation in demanding production environments.

Applications


  • Semiconductor Processing: Ideal for wafer dicing, trimming, and repair.

  • Micromachining: Suitable for precision cutting, drilling, and structuring of hard materials.

  • Medical Device Manufacturing: Ensures accurate marking and microstructuring of components.

  • Thin Film Ablation: Excellent for precision removal of coatings in display or optical manufacturing.

  • Solar Cell Scribing: Enables fine, damage-free scribing of photovoltaic cells.

  • Scientific Research: Useful in high-precision experiments requiring stable DUV sources.