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Description

The PP-UVFS-12.7-6.35-ULLM3 from OPTOMAN is a UV fused silica ultrafast laser mirror designed for efficient reflection of green laser wavelengths in the 500–530 nm range, with a design wavelength around 515 nm. Built on a 12.7 mm diameter, 6.35 mm thick UVFS substrate, this mirror combines very high reflectivity, low group delay dispersion, and high laser damage resistance, making it well suited for femtosecond and picosecond laser systems.

The front surface features a broadband high-reflectivity IBS coating optimized for 45° angle of incidence, delivering >99.95% reflectivity for s-polarization and >99.9% for p-polarization across the operating band. With GDD below 20 fs² and pulsed damage threshold values suitable for ultrashort-pulse operation at 515 nm, the mirror is a strong choice for beam steering, pulse-preserving transport, and cavity or beam-delivery setups in ultrafast laser applications.

Manufactured on a high-quality UV fused silica substrate with 10-5 scratch-dig surface quality and <λ/8 flatness at 633 nm, this optic is intended for demanding laboratory and industrial photonics environments where pulse fidelity, optical durability, and stable broadband performance are important.

Precision Ultrafast Laser Mirror PP-UVFS-12.7-6.35-ULLM3

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Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 500 – 530 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): 10-5
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/8
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 20 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-ULLM3
FindLight SKU: FL-24419

Got questions about specs? Use the inquiry form to ask.

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Features

  • Ultrafast laser mirror for 500–530 nm spectral range
  • Designed for 515 nm operation at 45° angle of incidence
  • High reflectivity coating: >99.95% (s-pol) and >99.9% (p-pol)
  • Low group delay dispersion: <20 fs² to help preserve ultrashort pulses
  • UV fused silica substrate for excellent optical quality and thermal stability
  • Suitable for femtosecond and picosecond laser systems
  • High pulsed LIDT for demanding high-peak-power applications12.7 mm diameter × 6.35 mm thickness standard round optic format
  • 10-5 scratch-dig surface quality and <λ/8 surface flatness
  • Rear surface uncoated

Applications

  • Beam steering in ultrafast laser systems operating near 515 nm
  • Yb-based laser harmonics and green ultrafast beam delivery
  • Femtosecond and picosecond laser material processing setups
  • Scientific spectroscopy and nonlinear optics experiments
  • Precision micromachining and microfabrication platforms
  • Pulse-preserving relay optics in research and OEM laser systems
  • Ultrafast amplifier, oscillator, and beam-routing assemblies

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is this mirror designed for?
This mirror is designed for ultrafast laser applications in the green spectral region, especially around 515 nm. It is intended for use in femtosecond and picosecond laser systems where high reflectivity and low dispersion are important for maintaining pulse quality.
What wavelength range does this mirror support?
The mirror is optimized for operation in the 500–530 nm range, with a design wavelength centered near 515 nm. This makes it suitable for green ultrafast laser sources, including frequency-converted systems based on Yb lasers.
Why is low group delay dispersion (GDD) important for this optic?
Low GDD helps minimize pulse broadening when reflecting ultrashort laser pulses. In femtosecond and picosecond systems, this is important because excessive dispersion can distort the pulse shape and reduce peak power at the target.
At what angle of incidence is this mirror intended to operate?
This mirror is designed for use at 45° angle of incidence. Its coating performance, including reflectivity for s- and p-polarized light, is specified for this geometry, so it is best used in setups that match this incidence angle.
What types of applications is this mirror suitable for?
Typical applications include beam steering in ultrafast laser systems, pulse-preserving beam delivery, laser micromachining setups, nonlinear optics experiments, and scientific research systems operating near 515 nm.

Got more questions? Use the inquiry form to ask the supplier directly.

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