PP-UVFS-25.4-6.35-ULLM19 1030 nm Ultrafast Laser Mirror

Name: PP-UVFS-25.4-6.35-ULLM19 1030 nm Ultrafast Laser Mirror
Brand: Optoman
SKU: FL-24421
Price: 195.00 USD
Availability: InStock

Description

The PP-UVFS-25.4-6.35-ULLM19 from OPTOMAN is a 25.4 mm UV fused silica ultrafast laser mirror engineered for 1030 nm femtosecond and picosecond laser systems. Built with an ion-beam-sputtered (IBS) high-reflectivity coating, it combines very high reflectance, low group delay dispersion, and broad angular tolerance in a single optic.

Unlike mirrors intended for one fixed incidence angle, this model is optimized to maintain strong performance over a 0° to 45° angle-of-incidence range, making it a good fit for beam steering, cavity routing, and flexible optical layouts in Yb-based ultrafast laser platforms. The mirror’s low-dispersion design helps preserve short-pulse integrity, while the fused-silica substrate and durable coating support reliable operation in demanding industrial and scientific environments. Product specs on the manufacturer page indicate >99.9% reflectivity at 1030 nm, low GDD, 25.4 mm diameter, and 6.35 mm thickness.

Specifications

Diameter:	25.4 mm
Thickness:	6.35 mm
Wavelength Range:	1000 – 1050 nm
Clear Aperture (CA):	80 %
Substrate Material:	UV Grade Fused Silica
Angle Of Incidence (AOI):	0 – 45 deg
Surface Quality, S1 (scratch-dig):	10-5
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer):	Lambda/4
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer):	Unspecified
Parallelism:	5 arcmin
S1 Surface:	Coated
S2 Surface:	Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength):	99.9 %
GDD R @ AOI, @ Peak Wavelength:	30 fs^2
Manufacturer Part Number (MPN):	PP-UVFS-25.4-6.35-ULLM19
FindLight SKU:	FL-24421

Got questions about specs? Use the inquiry form to ask.

Download Data Sheet

Features

Product type: Wide-angle ultrafast laser mirror / dielectric mirror
Center wavelength: 1030 nm
Designed for broad AOI operation: suitable for 0°–45° incidence
High reflectivity coating: >99.9% reflectance at 1030 nmLow dispersion performance: designed to minimize pulse broadening in ultrafast systems
IBS-coated front surface: for stable optical performance and coating durabilitySubstrate: UV fused silica (UVFS)
Diameter: 25.4 mmThickness: 6.35 mmClear aperture: >80%
Suitable for femtosecond and picosecond Yb-laser beam delivery and steering

Applications

This ultrafast mirror is suitable for 1030 nm Yb-doped laser systems used in research, precision manufacturing, and advanced photonics integration. Typical applications include beam steering in femtosecond laser setups, optical path folding in ultrafast laser workstations, pulse-preserving mirror stages, micromachining systems, nonlinear optics experiments, and industrial laser platforms requiring stable reflectivity over a broad range of incidence angles. It can be used in optical layouts where maintaining low dispersion and high reflection for ultrashort pulses is important.

Export & Trade Information

ECCN:	EAR99
HTS Code:	9001.90.6000
Estimated US Tariff:	10%

Importing, tariffs & codes (Quick Guide) →

$195.00

Volume Pricing:

Qty	Unit Price	Extended Price
5	$185.25	$926.25
10	$165.75	$1,657.50

Discounts apply automatically in cart.

Shipping:: $75.00 ⓘ
Ships from:: Lithuania
Est. US Tariff:: $19.50 ⓘ
Processing:: 1 days (Est. arrival by Nov 13)
Delivers to:: United States

Made by:: Optoman
Made in:: Lithuania
Warranty:: View full terms
Returns:: View return policy
Sold by:: Optoman
On FindLight:: since 2026

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Frequently Asked Questions

What is the PP-UVFS-25.4-6.35-ULLM19 mirror used for?

The PP-UVFS-25.4-6.35-ULLM19 is designed for use in ultrafast laser systems operating around 1030 nm. It is typically used for beam steering, optical path folding, and directing femtosecond or picosecond laser pulses while maintaining high reflectivity and low pulse distortion.

Is this mirror suitable for femtosecond lasers?

Yes. This mirror is intended for ultrafast laser applications, including femtosecond and picosecond systems. Its low-dispersion coating helps minimize pulse broadening, which is important when working with short laser pulses that are sensitive to optical dispersion.

What wavelength is this ultrafast mirror optimized for?

This mirror is optimized for operation at 1030 nm, a common wavelength for Yb-based ultrafast lasers. It is designed to provide very high reflectivity at that wavelength, making it suitable for systems where optical efficiency and pulse preservation are important.

Can the mirror be used at different angles of incidence?

Yes. One of the advantages of this model is that it is designed to operate across a broad angle-of-incidence range rather than only at a single fixed angle. This makes it useful in laser setups where the beam path requires more flexibility in mirror placement and alignment.

What substrate is used for the PP-UVFS-25.4-6.35-ULLM19 mirror?

Got more questions? Use the inquiry form to ask the supplier directly.