Description
The OPTOMAN PCX-F175-UVFS-25.4-ET2.0-AR909-AR909 is a premium plano-convex laser lens engineered for high-power 1064 nm laser systems where exceptional transmission, low optical loss, and outstanding laser damage resistance are critical. Manufactured from high-quality UV-grade fused silica (JGS1) and coated with ion beam sputtered (IBS) anti-reflection coatings on both surfaces, this lens delivers reflectance below 0.1% at 1064 nm while maintaining excellent wavefront quality.
Featuring a 25.4 mm diameter, 175 mm focal length, λ/6 surface accuracy, and a high laser-induced damage threshold of 55 J/cm² (1064 nm, 5 ns), it is well suited for demanding industrial, scientific, and research applications involving Nd:YAG and other high-energy infrared laser sources. The precision optical finish minimizes scattering and thermal effects, enabling stable beam focusing and long operational lifetime even under intense laser exposure.
PCX-F175-UVFS-25.4-ET2.0-AR909-AR909 Plano-Convex UV Fused Silica Lens 175 mm
Specifications
| Lens Type: | Plano-Convex |
|---|---|
| Material: | UVFS |
| Diameter: | 25.4 mm |
| Focal Length: | 175 mm |
| Edge Thickness, Te: | 2 mm |
| Surface Quality, S1/S2 (scratch-dig): | 20-10 |
| Surface Irregularity, S1/S2: | <= Lambda/6 |
| Manufacturer Part Number (MPN): | PCX-F175-UVFS-25.4-ET2.0-AR909-AR909 |
| FindLight SKU: | FL-24749 |
Got questions about specs? Use the inquiry form to ask.
Features
- Manufacturer Part Number: PCX-F175-UVFS-25.4-ET2.0-AR909-AR909
- Plano-convex spherical lens for efficient laser beam focusing
- UV-grade fused silica (JGS1) substrate with excellent transmission and thermal stability
- Precision IBS anti-reflection coating on both surfaces
- Reflectance below 0.1% at 1064 nm
- 175 mm focal length with ±1% tolerance
- 25.4 mm diameter for compatibility with standard optomechanical mounts
- High laser damage threshold of 55 J/cm² (1064 nm, 5 ns)
- λ/6 transmitted wavefront accuracy over the clear aperture
- 20-10 scratch-dig surface quality for reduced scattering
- Centration error below 3 arcmin for accurate beam alignment
- Designed for demanding nanosecond high-power laser applications
Applications
- High-power Nd:YAG laser beam focusing
- Industrial laser micromachining
- Laser welding and cutting systems
- Laser marking and engraving equipment
- Scientific laser laboratories
- Optical research and photonics experiments
- Precision spectroscopy systems
- Beam delivery and optical integration
- High-energy laser test setups
- OEM laser equipment operating at 1064 nm
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.4000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What makes this lens suitable for high-power laser applications?
Which laser wavelength is this lens optimized for?
Why choose a plano-convex lens for laser focusing?
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Got more questions? Use the inquiry form to ask the supplier directly.
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