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Description

The OPTOMAN PCX-F250-UVFS-25.4-ET2.0-AR784-AR784 is a 25.4 mm diameter UVFS (JGS1) plano-convex lens designed for precision beam focusing in 515 nm ultrafast laser systems. It provides a +250 mm focal length, >80% clear aperture, and <λ/6 surface irregularity over the clear aperture. Both surfaces feature IBS anti-reflection coatings with AR <0.1% at 515 nm, helping minimize reflection losses and improve optical transmission.

Designed for femtosecond and picosecond applications, the lens combines low absorption, low optical loss, minimal group delay dispersion, and an estimated laser-induced damage threshold above 0.25 J/cm² at 515 nm, 500 fs, 10 kHz. Its 20-10 surface quality and <3 arcmin centration error support accurate beam delivery and focusing in demanding photonics setups.

PCX-F250-UVFS-25.4-ET2.0-AR784-AR784 515 nm Ultrafast Plano-Convex Laser Lens

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Specifications

Lens Type: Plano-Convex
Material: UVFS
Diameter: 25.4 mm
Focal Length: 250 mm
Edge Thickness, Te: 2 mm
Surface Quality, S1/S2 (scratch-dig): 20-10
Surface Irregularity, S1/S2: <= Lambda/6
Manufacturer Part Number (MPN): PCX-F250-UVFS-25.4-ET2.0-AR784-AR784
FindLight SKU: FL-24758

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Features

  • 25.4 mm diameter UVFS (JGS1) plano-convex lens
  • +250 mm focal length at 546.1 nm
  • Optimized for 515 nm ultrafast laser systems
  • IBS anti-reflection coating with AR <0.1% at 515 nm on both surfaces
  • High-performance optics for femtosecond and picosecond lasers
  • Estimated LIDT >0.25 J/cm² at 515 nm, 500 fs, 10 kHz
  • Surface irregularity <λ/6 at 633 nm over the clear aperture
  • 20-10 surface quality according to MIL-PRF-13830B
  • >80% clear aperture
  • Centration error below 3 arcmin
  • Low absorption and minimal group delay dispersion

Applications

  • 515 nm ultrafast laser beam focusing
  • Second-harmonic Yb:YAG femtosecond laser systems
  • Picosecond and femtosecond laser beam delivery
  • Precision laser focusing and beam control
  • Ultrafast laser micromachining and material processing
  • Nonlinear optics and second-harmonic generation experiments
  • Scientific and industrial photonics instrumentation
  • High-peak-power laser optical systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.4000
Estimated US Tariff: 10%

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Frequently Asked Questions

What is the focal length of the PCX-F250-UVFS-25.4-ET2.0-AR784-AR784 lens?
The lens has a positive focal length of +250 mm, specified at 546.1 nm with a tolerance of ±1%.
What wavelength is this plano-convex lens designed for?
The lens is optimized for 515 nm operation and features IBS anti-reflection coatings providing less than 0.1% reflectance at normal incidence on both surfaces.
What material is used for this OPTOMAN laser lens?
The PCX-F250-UVFS-25.4-ET2.0-AR784-AR784 is manufactured from UVFS (JGS1) ultraviolet fused silica, making it suitable for demanding laser and ultrafast optical applications.
Is this lens suitable for femtosecond lasers?
Yes. It is specifically designed for femtosecond and picosecond laser systems, with low absorption, minimal GDD, and an estimated LIDT above 0.25 J/cm² under the specified 515 nm, 500 fs, 10 kHz conditions.
What laser systems can use this 515 nm lens?
The lens is intended for 515 nm second-harmonic applications and can be used in ultrafast Yb:YAG laser systems, including platforms such as PHAROS, CARBIDE, Monaco, FemtoBlade, TruMicro, IceFyre FS, Satsuma, Tangor, FemtoLux, FSL1030X2, Jasper X1, and FS Series systems.

Got more questions? Use the inquiry form to ask the supplier directly.

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