Description

The OPTOMAN PCV-F200-UVFS-25.4-CT2.0-AR784-AR784 is a 25.4 mm diameter concave lens manufactured from UVFS (JGS1) and designed for precision beam control in ultrafast laser systems. With a -200 mm focal length, the lens provides controlled beam divergence while maintaining high optical quality for demanding photonics applications.

Its IBS anti-reflective coating is optimized for 515 nm, with less than 0.1% reflectance at normal incidence on both surfaces. The lens features a 2.0 mm central thickness, greater than 80% clear aperture, 20-10 surface quality, and surface irregularity below λ/6 at 633 nm. Its estimated laser-induced damage threshold exceeds 0.25 J/cm² at 515 nm for 500 fs pulses at 10 kHz, making it suitable for femtosecond and picosecond laser applications where low optical loss and pulse preservation are important.

PCV-F200-UVFS-25.4-CT2.0-AR784-AR784 Concave Lens 515 nm

Specifications

Lens Type: Plano-Concave
Material: UVFS
Diameter: 25.4 mm
Focal Length: -200 mm
Edge Thickness, Te: 2.881 mm
Surface Quality, S1/S2 (scratch-dig): 20-10
Surface Irregularity, S1/S2: <= Lambda/6
Manufacturer Part Number (MPN): PCV-F200-UVFS-25.4-CT2.0-AR784-AR784
FindLight SKU: FL-24754

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Features

  • UV fused silica (UVFS/JGS1) substrate for high transmission and excellent laser durability
  • Plano-concave design with -200 mm focal length for controlled beam divergence and beam expansion
  • 25.4 mm diameter for compatibility with standard optical mounts and laboratory setups
  • 2.0 mm center thickness for compact optical system integration
  • AR784 anti-reflective coating optimized for 515 nm laser wavelengths
  • IBS coating technology with reflectance below 0.1% at 515 nm
  • 20-10 surface quality for high-quality laser beam transmission
  • Wavefront irregularity below λ/6 at 633 nm for precise optical performance
  • High laser-induced damage threshold for ultrafast laser applications
  • Low group delay dispersion for improved performance with femtosecond and picosecond pulses

Applications

  • Femtosecond laser beam expansion
  • Picosecond laser beam conditioning
  • 515 nm ultrafast laser systems
  • Yb:YAG second-harmonic laser applications
  • Laser beam divergence control
  • High-power and high-peak-power laser systems
  • Ultrafast optical setups requiring low dispersion
  • Precision beam delivery and beam shaping
  • Scientific and industrial photonics systems
  • Laser research and nonlinear optics experiments

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.4000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What type of lens is the PCV-F200-UVFS-25.4-CT2.0-AR784-AR784?
It is a plano-concave UV fused silica lens with a negative focal length of -200 mm. The concave optical geometry is intended for controlled beam divergence, beam expansion, and laser beam conditioning.
What wavelength is this lens optimized for?
The lens is optimized for 515 nm operation. Both surfaces have IBS anti-reflective coatings specified for reflectance below 0.1% at 515 nm at normal incidence.
What material is used for this OPTOMAN lens?
The lens is manufactured from UV fused silica (UVFS/JGS1), a material well suited to demanding laser applications because of its broad transmission range and strong thermal and optical performance.
Can this lens be used with ultrafast femtosecond lasers?
Yes. The lens is specifically designed for ultrafast laser applications, including femtosecond and picosecond systems. Its coating and optical design are intended to provide low loss while maintaining high laser damage resistance and low group delay dispersion.
What are the main specifications of this -200 mm concave lens?
The lens has a 25.4 mm diameter, 2.0 mm center thickness, -200 mm focal length at 546.1 nm, and a radius of curvature of approximately -92.016 mm. It has 20-10 surface quality, less than λ/6 surface irregularity at 633 nm, and an estimated LIDT above 0.25 J/cm² at 515 nm for 500 fs, 10 kHz pulses.

Got more questions? Use the inquiry form to ask the supplier directly.

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