Description
The OPTOMAN PCV-F200-UVFS-25.4-CT2.0-AR784-AR784 is a 25.4 mm diameter concave lens manufactured from UVFS (JGS1) and designed for precision beam control in ultrafast laser systems. With a -200 mm focal length, the lens provides controlled beam divergence while maintaining high optical quality for demanding photonics applications.
Its IBS anti-reflective coating is optimized for 515 nm, with less than 0.1% reflectance at normal incidence on both surfaces. The lens features a 2.0 mm central thickness, greater than 80% clear aperture, 20-10 surface quality, and surface irregularity below λ/6 at 633 nm. Its estimated laser-induced damage threshold exceeds 0.25 J/cm² at 515 nm for 500 fs pulses at 10 kHz, making it suitable for femtosecond and picosecond laser applications where low optical loss and pulse preservation are important.
PCV-F200-UVFS-25.4-CT2.0-AR784-AR784 Concave Lens 515 nm
Specifications
| Lens Type: | Plano-Concave |
|---|---|
| Material: | UVFS |
| Diameter: | 25.4 mm |
| Focal Length: | -200 mm |
| Edge Thickness, Te: | 2.881 mm |
| Surface Quality, S1/S2 (scratch-dig): | 20-10 |
| Surface Irregularity, S1/S2: | <= Lambda/6 |
| Manufacturer Part Number (MPN): | PCV-F200-UVFS-25.4-CT2.0-AR784-AR784 |
| FindLight SKU: | FL-24754 |
Got questions about specs? Use the inquiry form to ask.
Features
- UV fused silica (UVFS/JGS1) substrate for high transmission and excellent laser durability
- Plano-concave design with -200 mm focal length for controlled beam divergence and beam expansion
- 25.4 mm diameter for compatibility with standard optical mounts and laboratory setups
- 2.0 mm center thickness for compact optical system integration
- AR784 anti-reflective coating optimized for 515 nm laser wavelengths
- IBS coating technology with reflectance below 0.1% at 515 nm
- 20-10 surface quality for high-quality laser beam transmission
- Wavefront irregularity below λ/6 at 633 nm for precise optical performance
- High laser-induced damage threshold for ultrafast laser applications
- Low group delay dispersion for improved performance with femtosecond and picosecond pulses
Applications
- Femtosecond laser beam expansion
- Picosecond laser beam conditioning
- 515 nm ultrafast laser systems
- Yb:YAG second-harmonic laser applications
- Laser beam divergence control
- High-power and high-peak-power laser systems
- Ultrafast optical setups requiring low dispersion
- Precision beam delivery and beam shaping
- Scientific and industrial photonics systems
- Laser research and nonlinear optics experiments
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.4000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What type of lens is the PCV-F200-UVFS-25.4-CT2.0-AR784-AR784?
What wavelength is this lens optimized for?
What material is used for this OPTOMAN lens?
Can this lens be used with ultrafast femtosecond lasers?
What are the main specifications of this -200 mm concave lens?
Got more questions? Use the inquiry form to ask the supplier directly.
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