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Description

he OPTOMAN PCX-F100-UVFS-25.4-ET2.0-AR784-AR784 is a precision plano-convex lens designed for ultrafast laser and high-performance photonics applications at 515 nm. Manufactured from UV fused silica (UVFS/JGS1), this 25.4 mm diameter lens provides a +100 mm focal length and high optical quality for accurate beam focusing and collimation.

Both optical surfaces feature IBS anti-reflective coatings with reflection below 0.1% at 515 nm, helping reduce transmission losses in demanding laser systems. The lens is engineered with low wavefront distortion, high surface quality, and an estimated laser-induced damage threshold above 0.25 J/cm² for 500 fs pulses at 10 kHz. Its low absorption and minimal group delay dispersion make it particularly suitable for femtosecond and picosecond laser applications where pulse integrity and beam quality are critical.

PCX-F100-UVFS-25.4-ET2.0-AR784-AR784 100mm UVFS Plano-Convex Lens

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Specifications

Lens Type: Plano-Convex
Material: UVFS
Diameter: 25.4 mm
Focal Length: 100 mm
Edge Thickness, Te: 2 mm
Surface Quality, S1/S2 (scratch-dig): 20-10
Surface Irregularity, S1/S2: <= Lambda/6
Manufacturer Part Number (MPN): PCX-F100-UVFS-25.4-ET2.0-AR784-AR784
FindLight SKU: FL-24755

Got questions about specs? Use the inquiry form to ask.

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Features

  • UV fused silica (JGS1) substrate for high transmission and excellent laser durability
  • Plano-convex optical design with +100 mm focal length for precise beam focusing
  • 25.4 mm diameter for compatibility with standard optical mounts
  • AR784 anti-reflective coating optimized for 515 nm laser applications
  • Less than 0.1% reflectance at 515 nm to minimize optical losses
  • High surface quality of 20-10 scratch-dig for demanding laser applications
  • Surface irregularity below λ/6 at 633 nm for accurate wavefront control
  • Suitable for femtosecond and picosecond ultrafast laser systems

Applications

  • Femtosecond laser beam focusing
  • Picosecond laser beam focusing
  • 515 nm ultrafast laser systems
  • Yb:YAG second-harmonic laser systems
  • Precision laser micromachining
  • Ultrafast laser material processing
  • Scientific laser experiments
  • High-peak-power laser applications

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.4000
Estimated US Tariff: 10%

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Frequently Asked Questions

What wavelength is the PCX-F100-UVFS-25.4-ET2.0-AR784-AR784 designed for?
The lens is optimized for 515 nm laser operation. Both optical surfaces feature an IBS anti-reflective coating specified for less than 0.1% reflectance at 515 nm at 0° angle of incidence.
What is the focal length of this plano-convex lens?
The lens has a nominal positive focal length of +100 mm at 546.1 nm, with a specified tolerance of ±1%. Its radius of curvature is approximately 46.008 mm.
What material is used for this OPTOMAN laser lens?
The lens is manufactured from UV fused silica (UVFS), also designated JGS1. This substrate is well suited to demanding laser applications requiring high optical quality and reliable performance across ultraviolet and visible wavelengths.
Can this lens be used with ultrafast laser pulses?
Yes. The lens is specifically classified as an ultrafast optic and is designed for femtosecond and picosecond laser systems. Its coating is engineered for low optical loss and minimal group delay dispersion, helping preserve ultrashort laser pulses.
What is the estimated laser damage threshold of the lens?
OPTOMAN specifies an estimated LIDT greater than 0.25 J/cm² at 515 nm for 500 fs pulses operating at 10 kHz. Actual damage performance can depend on beam profile, pulse characteristics, contamination, alignment, and operating conditions.

Got more questions? Use the inquiry form to ask the supplier directly.

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