PCV-F100-UVFS-25.4-CT2.0-AR784 – UV Fused Silica Plano-Concave Lens

Name: PCV-F100-UVFS-25.4-CT2.0-AR784 – UV Fused Silica Plano-Concave Lens
Brand: Optoman
Price: 148.00 USD
Availability: InStock

Description

The OPTOMAN PCV-F100-UVFS-25.4-CT2.0-AR784 is a precision plano-concave laser lens designed for demanding ultrafast laser applications operating at 515 nm. Manufactured from premium UV-grade fused silica (JGS1), this 25.4 mm diameter lens features advanced ion beam sputtered (IBS) anti-reflective coatings on both optical surfaces, delivering less than 0.1% residual reflection for maximum transmission and minimal optical losses.

Its high laser-induced damage threshold, excellent wavefront quality, and low absorption make it an excellent choice for femtosecond and picosecond laser systems used in scientific research, precision manufacturing, and advanced photonics. The -100 mm focal length provides reliable beam expansion and divergence control while maintaining exceptional optical performance.

Specifications

Lens Type:	Plano-Concave
Material:	UVFS
Diameter:	25.4 mm
Focal Length:	-100 mm
Edge Thickness, Te:	3.788 mm
Surface Quality, S1/S2 (scratch-dig):	20-10
Surface Irregularity, S1/S2:	<= Lambda/6
Manufacturer Part Number (MPN):	PCV-F100-UVFS-25.4-CT2.0-AR784-AR784
FindLight SKU:	FL-24742

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Download Data Sheet

Features

Manufacturer Part Number: PCV-F100-UVFS-25.4-CT2.0-AR784
Plano-concave UV fused silica (JGS1) laser lens optimized for 515 nm operation
25.4 mm diameter with -100 mm focal length for controlled beam expansion
IBS anti-reflective coatings on both surfaces with <0.1% residual reflectance
High laser-induced damage threshold suitable for ultrafast femtosecond and picosecond lasers
Surface quality of 20-10 scratch-dig and surface irregularity better than λ/6 @ 633 nm
Clear aperture greater than 80% for efficient beam utilization
Centration error below 3 arcminutes for precise optical alignment
Precision-manufactured for demanding industrial and scientific laser applications

Applications

eam expansion in ultrafast laser systems
Laser beam shaping and divergence control
Frequency-doubled Yb:YAG laser platforms operating at 515 nm
Precision laser micromachining
Semiconductor and electronics manufacturing
Medical laser instrumentation
Scientific spectroscopy and optical research
High-power photonics laboratories
Ultrafast laser material processing

Export & Trade Information

ECCN:	EAR99
HTS Code:	9001.90.4000
Estimated US Tariff:	10%

Importing, tariffs & codes (Quick Guide) →

$148.00

Volume Pricing:

Qty	Unit Price	Extended Price
5	$140.60	$703.00
10	$125.80	$1,258.00

Discounts apply automatically in cart.

Shipping:

$75.00

Ships from:

Lithuania

Est. US Tariff:

$14.80

Processing:

1 days (Est. arrival by Nov 4)

Delivers to:

United States

Made by:

Optoman

Made in:

Lithuania

Warranty:

View full terms

Returns:

View return policy

Sold by:

Optoman

On FindLight:

since 2026

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Frequently Asked Questions

What is the PCV-F100-UVFS-25.4-CT2.0-AR784 lens designed for?

This plano-concave lens is designed for ultrafast laser systems operating at 515 nm, where high transmission, low optical losses, and excellent wavefront quality are essential for beam expansion and divergence control.

Why is UV-grade fused silica used for this lens?

UV-grade fused silica (JGS1) provides outstanding optical transmission, low absorption, excellent thermal stability, and high resistance to laser damage, making it ideal for high-power and ultrafast laser applications.

What advantages do the IBS anti-reflective coatings provide?

Ion Beam Sputtered coatings offer exceptionally low reflectance, excellent environmental durability, minimal absorption, and consistent optical performance, helping maximize laser throughput while reducing unwanted reflections.

Can this lens be used with femtosecond and picosecond lasers?

Yes. The lens is specifically engineered for ultrafast laser systems and combines a high laser-induced damage threshold with premium optical quality to preserve beam performance during high-peak-power operation.

Which applications benefit most from this plano-concave lens?

The lens is well suited for beam expansion, laser beam conditioning, precision material processing, scientific instrumentation, spectroscopy, semiconductor manufacturing, and other photonics applications requiring accurate control of 515 nm laser beams.

Got more questions? Use the inquiry form to ask the supplier directly.