TaperCamD-LCM CMOS Based Beam Profiler

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Specifications

Sensor Type: CMOS
Measurable Sources: CW, Pulsed
Wavelength Range: 355 – 1150 nm
# Pixels (Width): 2048
# Pixels (Height): 2048
Pixel Size (Width): 12.5 um
Pixel Size (Height): 12.5 um
Max Full Frame Rate: 60 Hz
ADC: 12-bit
Part Number: S-TCD-LCM
Beam Fits: Gaussian & Top Hat profile fit & % fit Equivalent Slit profile
Centroid Position: Relative and absolute | Intensity Weighted Centroid and Geometric Center | Beam Wander Display and Statistics
Measured & Displayed Profile Parameters: Raw and smoothed profiles Triangular running average filter up to 10% FWHM
Displayed Profiles: Line‚ 2D & 3D plots. Normalized or un-normalized. Linear or Logarithmic‚ Zoom x10 2D‚ 3D in 10‚ 32 or max. colors or grayscale Contoured display at 10 and 32 colors
Manual Beam Attenuation: Includes three 2" NDXL filters (NDXL-1, NDXL-2, NDXL-4)
Measurable Sources: CW beams‚ pulsed sources; CW to 12.6 kHz with single pulse isolation Software configurable Auto-trigger‚ Synchronous & Variable Delay
ADC: 12-bit
Electronic Shutter Range: USB 2.0: 12,600:1 (41 dB) | USB 3.0: 25,000:1 (44 dB)
Signal To RMS Noise: 2,500:1 (34 dB optical / 68 dB electrical)
Single Pulse Capture PRR: USB 2.0: 6.3 kHz | USB 3.0: 12.6 kHz
Shutter Type: Global
Min. Beam (10 Pixels): ~125 µm
Image Area: 25 x 25 mm
Measurement Accuracy (not Limited To Pixel Size): 0.1 µm processing resolution for interpolated diameters. | Absolute accuracy is beam profile dependent - ~1 µm accuracy is frequently achievable. | Centroid accuracy is also beam dependent (as good as ±1 µ since it is arithmetically determined from all pi
Processing Options: Image & profile Averaging‚ 1‚ 5‚ 10‚ 20‚ Continuous. | Background Capture and Subtraction. | User set rectangular Capture Block for capture | User set or Auto ellipse Inclusion region with beam tracking for processing | *.ojf files save all WinCamD custom
Pass/Fail Display: On-screen selectable Pass/Fail colors. Ideal for QA & Production.
Log Data And Statistics: Min.‚ Max.‚ Mean‚ Standard Deviation‚ to 4096 samples
Relative Power Measurement: Rolling histogram based on user's initial input. Units of mW‚ µJ‚ dBm‚ % or user choice (relative to a reference measurement input)
Fluence: Fluence‚ within user defined area
Certification: RoHS‚ WEEE‚ CE
Multiple Cameras: Up to 4 cameras, parallel capture. | 1 to 8 cameras, serial capture.
Head Dimensions‚ Width X Height X Depth: 2.25 x 2.25 x 2.13” (57 x 57 x 54 mm)
Mounting: 1/4-20 thread
Weight‚ Camera W/ NDXL And Filter Cover: 15.2 oz (431 g)
Beam Ellipticity: Major‚ Minor & Mean diameters. Auto-orientation of axes.
Beam Diameter: Diameter at two user set Clip levels Gaussian & ISO 11146 Second Moment beam diameters Equivalent diameter above a user defined Clip level Equivalent Slit and Knife Edge diameters
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Features



  • 355 to 1150 nm, standard CMOS detector

  • 4.2Mpixel, 2048 x 2048 pixels, 25 x 25 mm active area

  • 12.5 µm pixels (effective)

  • HyperCal™ – Dynamic noise and baseline correction software

  • Port-powered USB 3.0; flexible screw locking 3 m cable; no power brick

  • 12-bit ADC, on-board microprocessor

  • Window-free sensors standard for no fringing

  • 25,000:1 electronic auto-shutter, 79 µs to 2 s

  • 2,500:1 SNR

  • Global shutter, optical/TTL trigger

  • Isolated pulse triggering and parallel capture


Note: This product requires 64-bit Windows 7, 8/8.1, or 10

Applications



  • CW and pulsed laser profiling

  • Field servicing of lasers and laser-based systems

  • Optical assembly & instrument alignment

  • Beam wander & logging

  • Alignment and diagnostics of laser systems used in ophthalmology, dermatology, or endoscopic surgery

  • Used experiments involving SHG, OPOs, or other nonlinear processes that require beam control at tight foci

  • Useful in development and QA of optical read/write heads where small, highly focused beams are critical

  • Enables spatial profiling of tightly focused beams from laser diodes and VCSELs used in sensing or communication

  • Assists in beam shaping and optimization in advanced microscopy systems for biomedical imaging and dimensional metrology