BEAMAGE-M2 Automated Measurement System

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Specifications

Sensor Type: CMOS
Measurable Sources: CW, Pulsed
Wavelength Range: 350 – 1100 nm
Pixel Size (Width): 55 um
Pixel Size (Height): 55 um
ADC: 8-bit, 10-bit, 12-bit
Minimum Measurable Beam: 55 μm
Included Filter: 3 flip-mount attenuators for 8 levels of attenuation, from none to ND3.5
Sensor Technology: BEAMAGE-4M included
Effective Aperture: Ø 48 mm optics, 11.3 x 11.3 mm sensor
Beam Diameter Range: 55 μm to 11.3 mm, at the sensor
Mechanical Travel Range: 200 mm
Effective Optical Path Range: 400 mm
Lens Focal Length: 5 AR-coated lenses included: 200 mm, 250 mm, 300 mm, 400 mm and 500 mm
Typical M2 Accuracy: ±5%, depending on the beam quality and optical configuration
Typical M2 Repeatability: ±2%, depending on the beam quality and optical configuration
Typical Measurement Time: 45 sec with full-frame acquisition
Beam Diameter Definitions: D4σ (ISO compliant) 1/e2 along crosshairs (13.5%) FWHM along crosshairs (50%) Custom (%)
D4σ (ISO Compliant) 1/e2 Along Crosshairs (13.5%) FWHM Along Crosshairs (50%) Custom (%): D4σ (ISO compliant) 1/e2 along crosshairs (13.5%) FWHM along crosshairs (50%) Custom (%)
Dimensions: 172H x 193W x 602D mm
Weight: 6.6 kg
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Features


  • Spectral Range: Covers wavelengths from 350 to 1150 nm

  • Fiber Optic Taper: Designed for large beams, providing accurate measurements

  • High-Resolution Sensor: Equipped with a 4.2 MPixel CMOS sensor

  • ISO-Compliant: Provides ISO-compliant measurements for beam characterization

  • Pixel Multiplication Factor (PMF): Offers a PMF of 1.8 (typical)

  • Minimum Measurable Beam: Measures beams with a minimum size of 120 μm

  • Global Shutter: Offers precise measurements of dynamic laser beams

  • Fast Frame Rate: Operates at a frame rate of 6.2 fps at 4.2 MPixels

  • High-Resolution Beam Profiling: Ideal for applications demanding detailed beam profiling

Applications


  • Suitable for laser beam analysis, particularly for large beams

  • Ideal for research, industrial, and scientific laser systems

  • Accurate characterization of laser beam profiles for quality control and research purposes