Description
The OPTOMAN PW0.5-UVFS-12.7-5.0-ULLM32 is a precision ultrafast laser line mirror engineered for demanding femtosecond and picosecond laser applications operating around 1030 nm. Manufactured on a high-quality UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers greater than 99.9% reflectivity across the 1010–1050 nm wavelength range while maintaining exceptionally low group delay dispersion (|GVD| <20 fs²).
Designed for angles of incidence from 0° to 10°, the wedged optic helps minimize unwanted back reflections and etalon effects, preserving beam quality in high-power ultrafast laser systems. Its high laser-induced damage threshold, precision optical surface, and stable dielectric coating make it an excellent choice for scientific research, industrial micromachining, nonlinear optics, and OEM laser integration where pulse integrity and long-term reliability are essential.
PW0.5-UVFS-12.7-5.0-ULLM32 Ultrafast Laser Line Mirror
Specifications
| Diameter: | 12.7 mm |
|---|---|
| Thickness: | 5 mm |
| Wavelength Range: | 1010 – 1050 nm |
| Clear Aperture (CA): | 10 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 0 – 10 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 30 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD R @ AOI, @ Peak Wavelength: | 20 fs^2 |
| Manufacturer Part Number (MPN): | PW0.5-UVFS-12.7-5.0-ULLM32 |
| FindLight SKU: | FL-24451 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PW0.5-UVFS-12.7-5.0-ULLM32
- Optimized for 1030 nm ultrafast laser systems
- High reflectivity >99.9% from 1010–1050 nm
- Ultra-low group delay dispersion (|GVD| <20 fs²) for minimal pulse distortion
- Ion Beam Sputtered (IBS) dielectric coating for excellent durability and coating stability
- UV fused silica (Corning 7980) substrate for superior optical performance
- 12.7 mm diameter with 5.0 mm maximum thickness
- Wedged design (30 arcmin) minimizes parasitic reflections
- Surface flatness better than λ/8 @ 633 nm
- High laser-induced damage threshold suitable for high-peak-power femtosecond and picosecond lasers
- Compatible with 0–10° angle of incidence optical layouts
Applications
- Yb:YAG femtosecond laser systems
- Picosecond laser beam steering
- Ultrafast laser pulse delivery
- Precision laser micromachining
- Nonlinear optical experiments
- Scientific and university laser laboratories
- Industrial laser processing equipment
- Optical amplifier and beam transport systems
- OEM ultrafast laser integration
- High-power research laser platforms
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the PW0.5-UVFS-12.7-5.0-ULLM32 designed for?
Why is low group delay dispersion important for ultrafast lasers?
What benefits does the wedged substrate provide?
Can this mirror handle high-power ultrafast laser pulses?
What applications is this mirror best suited for?
Got more questions? Use the inquiry form to ask the supplier directly.
Similar Products
Your inquiry has been received.
Create an account by adding a password
Why create an account?
- Auto-complete inquiry forms
- View and manage all your past messages
- Save products to your favorites
- Close your account anytime — no hassle