Description

The OPTOMAN PP-UVFS-50.8-9.52-ULLM8SHL is a high-performance ultrafast laser mirror designed for demanding femtosecond and picosecond laser applications operating around 1030 nm. Manufactured from UV fused silica and featuring an advanced IBS dielectric coating, this 50.8 mm diameter mirror delivers exceptional reflectivity, high laser-induced damage threshold (LIDT), and reliable performance under extreme peak power conditions.

Optimized for normal incidence operation, the mirror provides more than 99.9% reflectivity at 1030 nm while maintaining low absorption and excellent optical stability. Its high-durability coating technology helps minimize degradation effects during long-term exposure to intense ultrafast laser pulses, making it suitable for high-power beam delivery systems, pulse compression setups, and advanced Yb-based ultrafast laser platforms.

PP-UVFS-50.8-9.52-ULLM8SHL High Power 1030nm Ultrafast Laser Mirror

Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 200 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-ULLM8SHL (no SCC)
FindLight SKU: FL-24471

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Features

  • Manufacturer part number: PP-UVFS-50.8-9.52-ULLM8SHL
  • High reflectivity: HR >99.9% at 1030 nm
  • Designed for ultrafast femtosecond and picosecond laser systems
  • UV fused silica substrate for excellent thermal and optical stability
  • 50.8 mm diameter with 9.52 mm thickness
  • Optimized for 0° angle of incidence operation
  • IBS dielectric coating technology for high durability
  • High LIDT performance for high-intensity laser environments
  • Low group delay dispersion for preserving ultrashort pulse characteristics
  • Surface quality: 20-10 scratch-dig specification on coated surface
  • Flatness better than λ/10 at 633 nm

Applications

  • The PP-UVFS-50.8-9.52-ULLM8SHL ultrafast laser mirror is ideal for use in high-power ultrafast laser systems, including:
  • Femtosecond and picosecond laser beam steering
  • Yb:YAG-based ultrafast laser systems
  • High-power laser beam delivery assemblies
  • Pulse compression and multipass amplifier configurations
  • Industrial micromachining and precision laser processing
  • Scientific research systems requiring stable ultrashort pulse transmission and reflection

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the PP-UVFS-50.8-9.52-ULLM8SHL designed for?
This ultrafast laser mirror is optimized for 1030 nm operation and provides high reflectivity performance around the 1010–1050 nm spectral range, making it suitable for Yb-based laser systems.
What makes this mirror suitable for high-power ultrafast lasers?
The mirror combines a UV fused silica substrate with an IBS dielectric coating designed for high reflectivity, low absorption, and enhanced laser damage resistance. This allows reliable operation under intense femtosecond and picosecond laser pulses.
Can this mirror be used in femtosecond laser systems?
Yes. The PP-UVFS-50.8-9.52-ULLM8SHL is specifically developed for ultrafast laser applications where maintaining pulse duration and minimizing dispersion are critical factors.
What is the laser-induced damage threshold of this mirror?
The measured LIDT values exceed 0.9 J/cm² for 1030 nm, 200 fs pulses at 500 kHz and exceed 4 J/cm² for 1030 nm, 500 ps pulses at 100 Hz under p-polarized conditions.
What type of laser systems commonly use this ultrafast mirror?
This mirror is suitable for advanced Yb:YAG ultrafast laser platforms, including industrial and research systems used for precision manufacturing, spectroscopy, nonlinear optics, and high-field laser experiments.

Got more questions? Use the inquiry form to ask the supplier directly.

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