Description
The OPTOMAN PP-UVFS-50.8-9.52-ULLM5 (NO SCC) is a high-performance ultrafast laser mirror designed for demanding Yb:YAG and femtosecond laser applications operating around the 1030 nm wavelength range. Manufactured with a UV fused silica substrate and an advanced ion beam sputtered (IBS) high-reflectivity coating, this mirror delivers excellent optical performance with minimal dispersion and high laser damage resistance.
Featuring high reflectance above 99.95% for S-polarization and above 99.9% for P-polarization at 1010–1050 nm with a 45° angle of incidence, the PP-UVFS-50.8-9.52-ULLM5 minimizes optical losses in ultrafast laser systems. Its low group delay dispersion characteristics make it suitable for precision applications where pulse integrity and temporal stability are critical.
The 50.8 mm diameter mirror is fabricated from UV fused silica with high surface quality, excellent flatness, and tight dimensional tolerances, making it ideal for research laboratories, industrial laser processing systems, and advanced photonics platforms.
PP-UVFS-50.8-9.52-ULLM5 Ultrafast Laser Mirror 1030nm
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 1010 – 1050 nm |
| Clear Aperture (CA): | 85 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/2 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Lambda/8 |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.95 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 10 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 20 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM5 (no SCC) |
| FindLight SKU: | FL-24438 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- 50.8 mm diameter UV fused silica substrate for high-performance laser applications
- Optimized for 1010–1050 nm wavelength range, including 1030 nm Yb laser systems
- IBS high-reflectivity coating with HRs >99.95% and HRp >99.9%
- Low group delay dispersion design with |GDD Rs| <10 fs² and |GDD Rp| <20 fs²
- Designed for 45° angle of incidence operation
- High laser-induced damage threshold for demanding ultrafast laser environments
- Surface flatness better than λ/8 over the specified aperture area
- 20-10 scratch-dig surface quality for reliable beam handling
Applications
- Ultrafast femtosecond laser systems
- Yb:YAG laser setups and harmonic generation systems
- Chirped pulse amplification (CPA) architectures
- High-power laser research platforms
- Attosecond science and nonlinear optics experiments
- Precision laser machining and micromachining systems
- Scientific and industrial photonics applications
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength range is the OPTOMAN PP-UVFS-50.8-9.52-ULLM5 mirror designed for?
What type of coating is used on this ultrafast laser mirror?
What makes this mirror suitable for femtosecond laser systems?
What is the substrate material of the PP-UVFS-50.8-9.52-ULLM5 mirror?
Can this mirror be used in high-power laser environments?
Got more questions? Use the inquiry form to ask the supplier directly.
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