Description
The OPTOMAN PP-UVFS-50.8-9.52-ULLM5-SSC is a precision ultrafast laser line mirror engineered for high-power Yb:YAG laser systems operating between 1010 and 1050 nm. Manufactured on a UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers exceptionally high reflectivity, minimal group delay dispersion (GDD), and excellent laser-induced damage threshold (LIDT), making it ideal for preserving femtosecond and picosecond pulse quality.
Designed for 45° angle of incidence, the mirror features a stress-compensating coating on the rear surface to enhance substrate stability and reduce coating-induced deformation. With λ/8 surface flatness, superior optical quality, and proven durability under demanding laser conditions, it is well suited for industrial, scientific, and OEM ultrafast laser applications requiring reliable beam steering without compromising pulse integrity.
PP-UVFS-50.8-9.52-ULLM5-SSC Ultrafast Laser Line Mirror 1010–1050 nm
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 1010 – 1050 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Coated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.95 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 10 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 20 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM5 (SCC) |
| FindLight SKU: | FL-24472 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM5-SSC
- Optimized wavelength range: 1010–1050 nm
- High reflectivity exceeding 99.95% (s-polarization) and 99.9% (p-polarization) at 45° AOI
- Low Group Delay Dispersion: |GDD Rs| <10 fs², |GDD Rp| <20 fs²
- Ion Beam Sputtered (IBS) dielectric coating for exceptional optical stability
- UV fused silica substrate with 50.8 mm diameter and 9.52 mm thickness
- Stress-compensating rear-side coating minimizes substrate deformation
- Surface flatness better than λ/8 @ 633 nm
- 20-10 scratch-dig optical surface quality
- High measured LIDT suitable for femtosecond and picosecond laser systems
- Designed for high-power Yb:YAG ultrafast laser beam steering and pulse preservation.
Applications
- Yb:YAG femtosecond and picosecond laser systems
- Ultrafast laser beam steering and folding optics
- Precision laser micromachining
- Semiconductor and electronics manufacturing
- Laser materials processing
- Scientific ultrafast spectroscopy
- Optical research laboratories
- Nonlinear optics experiments
- OEM ultrafast laser integration
- High-power industrial laser workstations.
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What laser wavelength is this mirror optimized for?
Why is low Group Delay Dispersion important?
What is the purpose of the stress-compensating coating (SSC)?
Can this mirror withstand high-power ultrafast laser pulses?
Which laser systems is this mirror compatible with?
Got more questions? Use the inquiry form to ask the supplier directly.
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