Description

The OPTOMAN PP-UVFS-50.8-9.52-ULLM31 is a premium ion beam sputtered (IBS) ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications operating at 515 nm. Designed for frequency-doubled Yb-based laser systems, this wide-angle dielectric mirror delivers greater than 99.9% reflectivity over an exceptionally broad 0–45° angle of incidence, allowing greater flexibility in optical system design without compromising beam quality or pulse integrity.

Manufactured on a precision UV fused silica substrate with excellent surface quality and low group delay dispersion (GDD), the mirror preserves ultrashort pulse characteristics while offering high laser-induced damage threshold (LIDT) and outstanding long-term stability. Its advanced IBS coating minimizes absorption and scattering, making it well suited for high-power scientific, industrial, and research laser systems where reliable performance and repeatable optical alignment are essential.

PP-UVFS-50.8-9.52-ULLM31 Wide-Angle 515 nm Ultrafast Laser Mirror

Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 515 – 515 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-ULLM31
FindLight SKU: FL-24442

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM31
  • Optimized for 515 nm ultrafast laser wavelength
  • Wide-angle operation from 0° to 45° AOI
  • >99.9% reflectivity across the specified angular range
  • Low Group Delay Dispersion (Low GDD) for ultrashort pulse preservation
  • High laser-induced damage threshold for high-power applications
  • Ion Beam Sputtered (IBS) dielectric coating for exceptional durability
  • UV fused silica substrate with 50.8 mm diameter and 9.52 mm thickness
  • λ/8 surface flatness and 20-10 scratch-dig surface quality
  • Ideal for femtosecond and picosecond Yb:YAG second-harmonic laser systems

Applications

  • Frequency-doubled Yb:YAG ultrafast laser systems
  • Femtosecond laser beam steering
  • Picosecond laser processing equipment
  • Precision laser micromachining
  • Ultrafast spectroscopy
  • Biomedical laser instrumentation
  • Scientific optical research
  • Industrial laser manufacturing
  • Nonlinear optics experiments
  • High-power optical beam delivery systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What laser wavelength is the PP-UVFS-50.8-9.52-ULLM31 designed for?
This mirror is specifically optimized for 515 nm lasers, making it ideal for frequency-doubled Yb-based ultrafast laser systems that require high reflectivity and low pulse distortion.
Why is a wide-angle ultrafast mirror beneficial?
Unlike mirrors optimized for a single incidence angle, this mirror maintains excellent reflectivity and low dispersion from 0° to 45°, giving optical designers greater flexibility while preserving ultrashort laser pulses.
What is the advantage of the IBS coating?
Ion Beam Sputtering produces dense, durable optical coatings with extremely low absorption, high environmental stability, excellent repeatability, and a high laser damage threshold, making them suitable for demanding industrial and research environments.
Can this mirror be used in high-power femtosecond laser systems?
Yes. The mirror is designed for ultrafast high-power laser applications and combines high reflectivity, low GDD, and a high laser-induced damage threshold to maintain reliable performance under demanding operating conditions.
Which applications are best suited for this mirror?
The PP-UVFS-50.8-9.52-ULLM31 is ideal for laser micromachining, precision beam delivery, ultrafast spectroscopy, nonlinear optics, biomedical research, and scientific laser systems that require stable, low-dispersion reflection at 515 nm.

Got more questions? Use the inquiry form to ask the supplier directly.

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