Description
he OPTOMAN PP-UVFS-50.8-9.52-ULLM3-NO-SSC is a precision ion beam sputtered (IBS) ultrafast laser line mirror engineered for demanding femtosecond and picosecond laser systems operating in the 500–530 nm spectral range. Designed for the second harmonic of Yb-based laser sources, this dielectric mirror combines exceptionally high reflectivity with ultra-low group delay dispersion (GDD) to preserve pulse duration and beam quality throughout high-power optical systems.
Manufactured on a premium UV fused silica substrate, the mirror delivers excellent thermal stability, outstanding optical performance, and high laser-induced damage resistance. Optimized for 45° angle of incidence, it supports both s- and p-polarized beams with reflectivity exceeding 99.9%, making it an excellent choice for ultrafast laser beam steering, amplification stages, and precision scientific instrumentation.
PP-UVFS-50.8-9.52-ULLM3-NO-SSC Ultrafast Laser Line Mirror
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 505 – 530 nm |
| Clear Aperture (CA): | 85 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.95 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 10 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 15 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM3 (no SCC) |
| FindLight SKU: | FL-24468 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-ULLM3-NO-SSC
- High-reflectivity dielectric coating for 500–530 nm
- Optimized for 45° angle of incidence
- Reflectivity up to >99.95% (s-polarization) and >99.9% (p-polarization)
- Ultra-low GDD for minimal pulse distortion in ultrafast laser systems
- Ion Beam Sputtered (IBS) coating for exceptional durability and coating uniformity
- UV fused silica substrate with excellent thermal and optical stability
- 50.8 mm diameter with 9.52 mm thickness
- High laser-induced damage threshold suitable for high-energy femtosecond and picosecond lasers
- Precision optical surface with excellent flatness and 20-10 scratch-dig surface quality
Applications
- Yb:YAG second-harmonic laser systems
- Ultrafast femtosecond laser beam delivery
- Picosecond laser processing equipment
- Chirped pulse amplification (CPA) systems
- Scientific spectroscopy and nonlinear optics
- Precision beam steering and folding optics
- High-power research laser laboratories
- Industrial micromachining and precision manufacturing
- Optical test and measurement systems
- Advanced photonics research
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength range is this mirror designed for?
Why is low group delay dispersion important?
Can this mirror handle high-power ultrafast lasers?
What does "NO-SSC" indicate?
Which laser systems commonly use this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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