Description
The OPTOMAN PP-UVFS-50.8-9.52-ULLM11 is a high-performance ultrafast UV laser mirror designed for demanding laser applications requiring reliable reflection in the ultraviolet wavelength range. Manufactured from UV fused silica (UVFS), this 50.8 mm diameter mirror features advanced Ion Beam Sputtering (IBS) coating technology for enhanced optical performance and durability.
Optimized for a 257 nm design wavelength and 45° angle of incidence, the mirror provides high reflectivity for UV laser systems, with reflectance exceeding 98.5% for s-polarized light from 235–280 nm and exceeding 97.5% for p-polarized light from 241–271 nm. Its low wavefront distortion and high surface flatness make it suitable for precision ultrafast laser setups, harmonic generation systems, spectroscopy, and advanced photonics research.
PP-UVFS-50.8-9.52-ULLM11 Ultrafast UV Laser Mirror 257 nm
Specifications
| Diameter: | 50.8 mm |
|---|---|
| Thickness: | 9.52 mm |
| Wavelength Range: | 235 – 280 nm |
| Clear Aperture (CA): | 40 % |
| Substrate Material: | UV Grade Fused Silica |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 0.17 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 98.5 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 97.5 % |
| GDD R @ AOI, @ Peak Wavelength: | 0 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-ULLM11 |
| FindLight SKU: | FL-24445 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer part number: PP-UVFS-50.8-9.52-ULLM11
- Ultrafast UV laser mirror optimized for 257 nm operation
- UV fused silica substrate for excellent UV transmission and thermal stability
- Diameter: 50.8 mm; thickness: 9.52 mm
- High-reflectivity IBS coating with HRs >98.5% at 235–280 nm and HRp >97.5% at 241–271 nm
- Designed for 45° angle of incidence
- Surface flatness: <λ/8 at 633 nm over clear aperture
- High durability coating technology for demanding laser environments
- Suitable for high-performance ultrafast and harmonic laser systems
Applications
- Ultrafast UV laser systems
- Excimer and harmonic generation laser setups
- Precision spectroscopy instruments
- Nonlinear optics experiments
- Biomedical laser technologies
- Advanced photonics research platforms
- High-power pulsed laser applications
- Scientific and industrial optical systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the OPTOMAN PP-UVFS-50.8-9.52-ULLM11 designed for?
What type of coating is used on this UV laser mirror?
What are the dimensions and substrate material of this optical mirror?
Can this mirror be used in ultrafast laser systems?
Why is UV fused silica used for this laser mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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