Description

The OPTOMAN PP-UVFS-50.8-9.52-UBBHR7 is a high-performance broadband ultrafast laser mirror engineered for precision control of femtosecond and picosecond laser pulses. Featuring an ion beam sputtered (IBS) dielectric coating on a UV fused silica substrate, this optical mirror delivers exceptional reflectivity across the 980–1080 nm wavelength range while maintaining ultra-low group delay dispersion.

Designed for demanding ultrafast laser systems, the mirror provides stable optical performance at a 45° angle of incidence, making it suitable for broadband near-infrared laser applications where pulse integrity, minimal dispersion, and high optical efficiency are critical. Its 50.8 mm diameter and 9.52 mm thickness provide mechanical stability for laboratory and industrial optical setups.

PP-UVFS-50.8-9.52-UBBHR7 Broadband Ultrafast Laser Mirror 980-1080nm

Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 980 – 1080 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/10
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 30 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 30 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-UBBHR7
FindLight SKU: FL-24487

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Features

  • High-reflectivity IBS coating with HRs >99.95% and HRp >99.9% from 980–1080 nm at 45° angle of incidence
  • Ultra-low group delay dispersion with |GDD Rs| and |GDD Rp| below 30 fs² across optimized spectral ranges
  • UV fused silica substrate providing excellent thermal stability, durability, and optical quality
  • Precision surface quality of 20-10 scratch-dig with surface flatness better than λ/10 at 633 nm
  • 50.8 mm diameter design with minimum 45 mm clear aperture for advanced laser beam handling
  • Optimized for broadband ultrafast laser systems requiring minimal pulse distortion and high reflectivity

Applications

  • Femtosecond laser systems
  • Picosecond laser systems
  • Ultrafast spectroscopy
  • Nonlinear optics experiments
  • Broadband near-infrared laser setups
  • Yb-based laser systems
  • Pulse characterization and compression systems
  • Research and industrial photonics applications

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the OPTOMAN PP-UVFS-50.8-9.52-UBBHR7 designed for?
The PP-UVFS-50.8-9.52-UBBHR7 is optimized for broadband ultrafast laser applications in the 980–1080 nm wavelength range, providing high reflectivity and low dispersion performance.
What type of coating is used on this ultrafast laser mirror?
This mirror features an ion beam sputtered (IBS) dielectric coating designed to achieve high reflectivity and controlled group delay dispersion for ultrafast laser pulses.
Why is UV fused silica used as the substrate material?
UV fused silica offers excellent optical transmission, thermal stability, and low expansion properties, making it suitable for precision ultrafast laser applications where beam quality and stability are essential.
What angle of incidence is recommended for this laser mirror?
The OPTOMAN PP-UVFS-50.8-9.52-UBBHR7 is designed for operation at a 45° angle of incidence, where its broadband coating performance is optimized.
Which laser applications can benefit from this broadband ultrafast mirror?
This mirror is ideal for femtosecond and picosecond laser systems, ultrafast spectroscopy, nonlinear optical experiments, and other photonics applications requiring high reflectivity with minimal pulse distortion.

Got more questions? Use the inquiry form to ask the supplier directly.

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