Description

The OPTOMAN PP-UVFS-50.8-9.52-MW98 is a premium ion beam sputtered (IBS) multiwavelength ultrafast laser mirror engineered for high-performance beam steering in Yb:YAG ultrafast laser systems. Designed to deliver exceptional reflectivity at 343 nm, 515 nm, and 1030 nm with minimal group delay dispersion (GDD), this mirror enables efficient handling of the fundamental wavelength and its second and third harmonics without changing optical components.

Manufactured on a precision UV fused silica substrate, the mirror combines outstanding surface quality, high optical flatness, and excellent laser-induced damage resistance for reliable operation in demanding industrial and scientific environments. Its optimized 45° angle of incidence makes it an ideal solution for ultrafast laser beam delivery, harmonic generation setups, micromachining systems, and advanced photonics research.

PP-UVFS-50.8-9.52-MW98 Multiwavelength Ultrafast Laser Mirror

Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 343 – 1030 nm
Clear Aperture (CA): 45 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.3 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.8 %
GDD R @ AOI, @ Peak Wavelength: 50 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-MW98
FindLight SKU: FL-24479

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-9.52-MW98
  • Simultaneous high reflectivity at 343 nm, 515 nm, and 1030 nm
  • IBS dielectric coating for superior durability and long-term optical stability
  • Very low group delay dispersion (±50 fs²) to preserve ultrashort pulse quality
  • Optimized for 45° angle of incidence
  • UV fused silica substrate with excellent thermal and mechanical stability
  • High laser-induced damage threshold for demanding ultrafast laser applications
  • 50.8 mm diameter with 9.52 mm thickness
  • Surface quality of 20-10 scratch-dig
  • Surface flatness better than λ/10 at 633 nm
  • Suitable for beam steering of the fundamental, second, and third harmonics of Yb:YAG femtosecond and picosecond lasers.

Applications

  • Ultrafast Yb:YAG laser systems
  • Femtosecond and picosecond laser beam delivery
  • Harmonic generation optical setups
  • Precision laser micromachining
  • Semiconductor and electronics processing
  • Scientific spectroscopy
  • Biomedical laser instrumentation
  • Nonlinear optics experiments
  • Research laboratories
  • Industrial laser manufacturing systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelengths is the PP-UVFS-50.8-9.52-MW98 designed for?
This mirror is optimized for simultaneous high reflectivity at 343 nm, 515 nm, and 1030 nm, allowing efficient operation with the fundamental wavelength and its second and third harmonics in Yb:YAG ultrafast laser systems.
Why is an IBS coating beneficial for ultrafast laser mirrors?
Ion Beam Sputtered coatings provide dense, highly durable dielectric layers with extremely low absorption, excellent environmental stability, high laser damage resistance, and consistent optical performance over long operating periods.
How does low group delay dispersion improve laser performance?
Low GDD minimizes pulse broadening and distortion, helping maintain the temporal characteristics of ultrashort laser pulses. This is essential for applications requiring maximum peak power and precision.
Can this mirror replace separate mirrors for different harmonic wavelengths?
Yes. Because it is designed to efficiently reflect 343 nm, 515 nm, and 1030 nm, the mirror simplifies multi-harmonic optical systems by eliminating the need to exchange mirrors when switching between these wavelengths.
What applications is this mirror best suited for?
The mirror is ideal for ultrafast laser beam steering, harmonic generation, precision micromachining, nonlinear optics, spectroscopy, biomedical laser systems, and advanced scientific research where high reflectivity and pulse preservation are critical.

Got more questions? Use the inquiry form to ask the supplier directly.

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