Description

The OPTOMAN PP-UVFS-50.8-9.52-LLM267EL is a premium non-degrading ultrafast laser mirror engineered for demanding 343 nm laser applications. Manufactured on a high-quality UV fused silica (JGS1) substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers exceptional reflectivity, high laser-induced damage threshold (LIDT), and outstanding long-term stability under continuous UV exposure.

Designed specifically for 45° angle of incidence with s-polarized light, the mirror provides greater than 99.6% reflectivity across the 337–349 nm wavelength range while maintaining excellent wavefront quality with λ/10 surface flatness. Unlike conventional UV dielectric mirrors that gradually degrade under prolonged high-power irradiation, the Enhanced Lifetime (EL) coating technology is designed to resist UV-induced coating degradation, extending operational lifetime beyond 10,000 hours and reducing maintenance requirements.

With its high optical performance and durability, the PP-UVFS-50.8-9.52-LLM267EL is an excellent choice for industrial femtosecond and picosecond laser systems used in precision manufacturing, microelectronics, scientific research, and advanced photonics applications.

PP-UVFS-50.8-9.52-LLM267EL Non-Degrading UV Ultrafast Laser Mirror

Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 337 – 349 nm
Clear Aperture (CA): 45 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/10
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.6 %
GDD R @ AOI, @ Peak Wavelength: 300 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-LLM267EL
FindLight SKU: FL-24458

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-9.52-LLM267EL
  • Designed for 343 nm Yb:YAG third harmonic laser systems
  • High reflectivity >99.6% for s-polarized light at 337–349 nm
  • Optimized for 45° angle of incidence
  • Non-degrading Enhanced Lifetime coating technology
  • Operational lifetime exceeding 10,000 hours under continuous UV exposure
  • UV fused silica (JGS1) substrate for excellent UV transmission and stability
  • Advanced Ion Beam Sputtering (IBS) dielectric coating
  • High laser-induced damage threshold exceeding 0.2 J/cm² at 343 nm, 300 fs
  • Surface flatness better than λ/10 @ 633 nm
  • 20-10 scratch-dig optical surface quality
  • 50.8 mm diameter with 9.52 mm thickness
  • Ideal for femtosecond and picosecond ultrafast laser systems

Applications

  • UV laser micromachining
  • Glass drilling and precision hole formation
  • Through-glass via (TGV) manufacturing
  • Semiconductor and microelectronics processing
  • Polymer and thin-film structuring
  • Precision laser materials processing
  • High-power femtosecond laser systems
  • Picosecond laser beam delivery
  • Scientific laser laboratories
  • Industrial photonics manufacturing
  • Yb:YAG third harmonic (343 nm) laser systems
  • OEM laser equipment integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What laser wavelength is this mirror optimized for?
The PP-UVFS-50.8-9.52-LLM267EL is optimized for 343 nm laser systems and provides greater than 99.6% reflectivity across the 337–349 nm wavelength range when used with s-polarized light at a 45° angle of incidence.
What makes the Enhanced Lifetime coating different from conventional UV mirrors?
The Enhanced Lifetime (EL) coating is designed to resist UV-induced coating degradation that commonly affects standard dielectric mirrors. This significantly extends operational life, minimizes performance drift, and reduces maintenance and replacement costs in high-duty-cycle laser systems.
Can this mirror be used with ultrafast femtosecond lasers?
Yes. The mirror is specifically designed for ultrafast femtosecond and picosecond laser applications and features a high laser-induced damage threshold suitable for demanding high-peak-power laser systems.
Which applications benefit most from this mirror?
This mirror is particularly well suited for UV laser micromachining, through-glass via (TGV) production, precision glass drilling, semiconductor manufacturing, polymer processing, and scientific laser research requiring stable long-term UV performance.
Why is UV fused silica used as the substrate?
UV fused silica offers excellent transmission in the ultraviolet spectrum, low thermal expansion, high optical homogeneity, and exceptional resistance to laser-induced damage, making it an ideal substrate for high-performance UV laser optics.

Got more questions? Use the inquiry form to ask the supplier directly.

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