Description

The OPTOMAN PP-UVFS-50.8-9.52-LLM198 is a premium IBS-coated multiwavelength ultrafast laser mirror engineered for demanding femtosecond and picosecond laser systems operating at both the fundamental 1030 nm wavelength and its second harmonic around 515 nm. Built on a precision UV fused silica substrate, this mirror delivers exceptionally high reflectivity for both s- and p-polarizations at a 45° angle of incidence while maintaining outstanding optical quality and long-term environmental stability.

Designed for high-power industrial and scientific laser applications, the mirror combines low optical losses, excellent surface flatness, and robust ion beam sputtered dielectric coatings to preserve beam quality and maximize system efficiency. It is an excellent choice for Yb:YAG and Yb-fiber laser systems used in precision material processing, nonlinear optics, ultrafast spectroscopy, and advanced photonics research.

PP-UVFS-50.8-9.52-LLM198 Multiwavelength Ultrafast Laser Mirror

Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 500 – 1070 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/6
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.8 %
GDD Rs @ AOI, @ Peak Wavelength: 20 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 40 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-LLM198
FindLight SKU: FL-24500

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-9.52-LLM198
  • Optimized for dual-wavelength operation at 515 nm and 1030 nm
  • High reflectivity coating for both s- and p-polarizations
  • Designed for 45° angle of incidence
  • Precision UV fused silica substrate for excellent thermal and optical performance
  • Ion Beam Sputtered (IBS) dielectric coating for superior durability and low absorption
  • 50.8 mm diameter with 9.52 mm thickness
  • Surface flatness better than λ/6 @ 633 nm over a 40 mm aperture
  • High-quality 10-5 scratch-dig surface finish
  • Ideal for ultrafast laser systems requiring excellent beam preservation and long service life.

Applications

  • Yb:YAG ultrafast laser systems
  • Yb-doped fiber laser platforms
  • Second harmonic generation (SHG) beam paths
  • Femtosecond and picosecond laser machining
  • Precision micromachining
  • Nonlinear optical experiments
  • Ultrafast spectroscopy
  • Optical research laboratories
  • Beam steering and folding in high-power laser systems
  • Scientific and industrial photonics instrumentation

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelengths is the PP-UVFS-50.8-9.52-LLM198 designed for?
This mirror is optimized for dual-wavelength operation around 515 nm and 1030 nm, making it suitable for laser systems utilizing both the fundamental and frequency-doubled output of Yb-based lasers.
Why is an IBS coating beneficial for ultrafast laser mirrors?
Ion Beam Sputtering produces dense, low-loss dielectric coatings with exceptional environmental stability, high laser damage resistance, and consistent optical performance, making them ideal for demanding ultrafast laser applications.
Can this mirror be used with high-power femtosecond lasers?
Yes. The mirror is specifically designed for ultrafast laser systems where high reflectivity, excellent beam quality, and durable coatings are essential for reliable long-term operation.
What optical substrate is used in this mirror?
The mirror is manufactured using precision UV fused silica, a material valued for its low thermal expansion, excellent transmission characteristics, and outstanding optical stability under demanding operating conditions.
Which applications benefit most from this mirror?
The PP-UVFS-50.8-9.52-LLM198 is well suited for ultrafast laser beam delivery, harmonic generation systems, precision material processing, nonlinear optics, laser research, and advanced photonics instrumentation where stable, high-efficiency reflection at both 515 nm and 1030 nm is required.

Got more questions? Use the inquiry form to ask the supplier directly.

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