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Description

The OPTOMAN PP-UVFS-50.8-9.52-LLM121 is a high-performance multiwavelength ultrafast laser mirror designed for precise beam steering in advanced femtosecond and picosecond laser systems. Featuring an ion beam sputtered (IBS) dielectric coating on a UV fused silica substrate, this mirror provides exceptional reflectivity at both 515 nm and 1030 nm wavelengths with ultra-low group delay dispersion.

Designed for Yb-based ultrafast laser applications, the PP-UVFS-50.8-9.52-LLM121 enables efficient handling of fundamental and second harmonic beams within the same optical setup. Its high reflectivity, low absorption coating technology, and excellent surface quality make it suitable for demanding applications requiring stable performance, minimal optical losses, and reliable operation under high-power laser conditions.

PP-UVFS-50.8-9.52-LLM121 Ultrafast Laser Mirror

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Specifications

Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 1030 – 1030 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-LLM121
FindLight SKU: FL-24448

Got questions about specs? Use the inquiry form to ask.

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Features

  • 515 nm and 1030 nm dual-wavelength high-reflectivity performance for harmonic laser systems
  • IBS dielectric coating technology for enhanced durability and low optical absorption
  • Reflectivity above 99.9% at both 515 nm and 1030 nm wavelengths at 45° angle of incidence
  • Ultra-low group delay dispersion with GDD values below 10 fs² for Rs and below 20 fs² for Rp
  • UV fused silica substrate with excellent thermal stability and optical quality
  • 50.8 mm diameter and 9.52 mm thickness design for integration into large-aperture laser systems
  • High surface quality of 20-10 scratch-dig and flatness better than λ/8 at 633 nm
  • Suitable for ultrafast laser systems requiring simultaneous fundamental and harmonic beam control

Applications

  • The OPTOMAN PP-UVFS-50.8-9.52-LLM121 ultrafast laser mirror is ideal for applications including
  • Yb:YAG ultrafast laser systems
  • Femtosecond and picosecond laser beam delivery systems
  • Second harmonic generation (SHG) optical setups
  • Multiwavelength laser beam routing and folding
  • High-power scientific and industrial laser platforms
  • Laser micromachining and precision material processing
  • Attosecond science and nonlinear optics experiments
  • Research and development laboratories using 515 nm and 1030 nm laser sources

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelengths does the OPTOMAN PP-UVFS-50.8-9.52-LLM121 mirror support?
The mirror is optimized for dual-wavelength operation at 515 nm and 1030 nm, making it suitable for applications involving both the fundamental wavelength and second harmonic generation from Yb-based ultrafast laser systems.
What type of coating is used on this ultrafast laser mirror?
The PP-UVFS-50.8-9.52-LLM121 uses an ion beam sputtered dielectric coating designed to provide high reflectivity, low absorption, and stable performance in demanding ultrafast laser environments.
Can this mirror be used for high-power femtosecond laser applications?
Yes. The mirror is designed for ultrafast laser systems where low dispersion, high reflectivity, and reliable operation under intense laser conditions are required. Its IBS coating technology supports demanding high-power applications.
What is the advantage of using a dual-wavelength ultrafast mirror?
A dual-wavelength mirror allows both the fundamental and harmonic laser beams to be controlled using the same optical component, simplifying system alignment and reducing the need for separate wavelength-specific mirrors.
What laser systems are compatible with the PP-UVFS-50.8-9.52-LLM121 mirror?
This mirror is suitable for various Yb-based ultrafast laser platforms, including systems used in industrial processing, nonlinear optics, spectroscopy, and scientific research environments.

Got more questions? Use the inquiry form to ask the supplier directly.

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