Description
The OPTOMAN PP-UVFS-38.1-12.7-LLM252 is a premium broadband ultrafast laser mirror engineered for demanding Ti:Sapphire femtosecond laser systems operating across the 740–860 nm spectral range. Manufactured on a UV fused silica substrate with advanced ion beam sputtered (IBS) dielectric coatings, this mirror delivers exceptionally high reflectivity while minimizing group delay dispersion (GDD), helping preserve ultrashort pulse duration and beam quality throughout optical systems.
Designed for a 45° angle of incidence, the mirror provides outstanding optical performance for ultrafast spectroscopy, nonlinear optics, biomedical imaging, and precision laser processing. Its durable IBS coating offers excellent environmental stability, making it suitable for research laboratories, OEM laser integration, and industrial photonics applications requiring long-term reliability.
PP-UVFS-38.1-12.7-LLM252 Broadband Ultrafast Laser Mirror
Specifications
| Diameter: | 38.1 mm |
|---|---|
| Thickness: | 12.7 mm |
| Wavelength Range: | 740 – 860 nm |
| Clear Aperture (CA): | 85 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 5 arcmin |
| S1 Surface: | Uncoated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.8 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 98 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 30 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 100 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-38.1-12.7-LLM252 |
| FindLight SKU: | FL-24491 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-38.1-12.7-LLM252
- Broadband operating wavelength: 740–860 nm
- Optimized for Ti:Sapphire ultrafast laser systems
- High reflectivity: HRs >99.8% with excellent p-polarization performance at 45° incidence
- Low group delay dispersion (GDD) to preserve femtosecond pulse characteristics
- Ion Beam Sputtered (IBS) dielectric coating for exceptional durability and environmental resistance
- UV fused silica substrate with 38.1 mm diameter and 12.7 mm thickness
- Surface flatness of λ/8 @ 633 nm over a 10 mm area
- Surface quality: 20-10 scratch-dig
- Ideal for precision scientific and industrial laser applications.
Applications
- Ti:Sapphire femtosecond laser systems
- Ultrafast spectroscopy
- Nonlinear optics experiments
- Multiphoton microscopy
- Biomedical imaging
- Precision laser micromachining
- Optical research laboratories
- OEM ultrafast laser integration
- Pulse compression and beam delivery systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength range is the PP-UVFS-38.1-12.7-LLM252 designed for?
Why is low group delay dispersion important?
What substrate material is used?
Can this mirror be used in high-power femtosecond laser systems?
Which applications benefit most from this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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