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Description

The OPTOMAN PP-UVFS-38.1-12.7-LLM134 is a premium ion beam sputtered (IBS) ultrafast laser mirror engineered for maximum reflectivity and exceptionally low optical loss at 1030 nm. Manufactured on a high-quality UV fused silica substrate, this mirror delivers greater than 99.995% reflectivity, ultra-low absorption, and excellent thermal stability, making it an outstanding choice for demanding femtosecond and picosecond laser systems.

Designed specifically for high-average-power Yb:YAG and ytterbium fiber laser platforms operating at normal incidence (0° AOI), the mirror minimizes heat generation, beam drift, and pulse energy loss during continuous operation. Its partial reflectivity in the visible spectrum (630–660 nm) also enables convenient beam alignment while preserving exceptional performance at the operating wavelength. These characteristics make the PP-UVFS-38.1-12.7-LLM134 an ideal optical component for precision laser micromachining, industrial materials processing, scientific research, and advanced photonics systems requiring outstanding optical efficiency and long-term reliability.

PP-UVFS-38.1-12.7-LLM134 Low-Loss 1030 nm Ultrafast Laser Mirror

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Specifications

Diameter: 38.1 mm
Thickness: 12.7 mm
Wavelength Range: 1030 – 1030 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/4
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 2 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.995 %
Manufacturer Part Number (MPN): PP-UVFS-38.1-12.7-LLM134
FindLight SKU: FL-24485

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-38.1-12.7-LLM134
  • Ultra-high reflectivity >99.995% at 1030 nm
  • Ion Beam Sputtered (IBS) dielectric coating for exceptional durability
  • Optimized for 0° angle of incidence
  • UV fused silica (Corning 7980 0F) substrate
  • Diameter: 38.1 mm
  • Thickness: 12.7 mm
  • Clear aperture: 25 mm
  • Ultra-low absorption below 1.5 ppm (best effort below 1 ppm)
  • Low thermal loading for high-average-power ultrafast lasers
  • Partial reflectivity at 630–660 nm for beam alignmen
  • tHigh laser-induced damage threshold optimized for CW and pulsed operation
  • Excellent surface quality and precision flatness for stable beam propagation

Applications

  • Femtosecond laser micromachining
  • Picosecond laser processing
  • Yb:YAG laser systems operating at 1030 nm
  • Ytterbium fiber laser beam delivery
  • High-average-power industrial laser equipment
  • Precision laser manufacturing
  • Scientific ultrafast optics research
  • Laser beam steering and folding optics
  • Semiconductor and electronics processing
  • Advanced photonics laboratories
  • OEM laser system integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary operating wavelength of the PP-UVFS-38.1-12.7-LLM134?
This mirror is optimized for maximum reflectivity at 1030 nm, making it ideal for Yb:YAG and ytterbium fiber laser systems operating at the fundamental wavelength.
Why is ultra-low optical loss important in ultrafast laser systems?
Ultra-low absorption and scattering reduce thermal effects such as beam drift, thermal lensing, and optical distortion. This helps maintain consistent beam quality and improves long-term system stability during high-power operation.
Can this mirror be used with femtosecond and picosecond lasers?
Yes. The mirror is specifically designed for ultrafast laser applications, supporting both femtosecond and picosecond pulse durations while maintaining excellent reflectivity and low dispersion characteristics.
Does the mirror support alignment using visible light?
Yes. In addition to its high reflectivity at 1030 nm, the coating provides partial reflectivity in the 630–660 nm range, allowing the use of visible alignment lasers during optical system setup.
Which laser systems is this mirror compatible with?
The mirror is suitable for a broad range of 1030 nm ultrafast laser platforms, including Yb:YAG and ytterbium fiber lasers used in precision micromachining, industrial materials processing, scientific research, and OEM laser integration. It is also compatible with many commercial laser systems based on the 1030 nm wavelength.

Got more questions? Use the inquiry form to ask the supplier directly.

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