Description

The OPTOMAN PP-UVFS-25.4-9.5-LLM134 is a premium IBS-coated low-loss ultrafast laser mirror engineered for demanding femtosecond and picosecond laser systems operating at 1030 nm. Manufactured on a high-quality UV fused silica substrate, this mirror delivers greater than 99.995% reflectivity at 1030 nm while providing partial reflectivity (>50%) across 630–660 nm, making it well suited for beam monitoring and alignment in Yb-based laser systems.

Designed with exceptionally low optical losses, high laser-induced damage threshold, and controlled group delay dispersion, the mirror helps preserve ultrashort pulse characteristics while maintaining outstanding beam quality. Its λ/8 surface flatness, 10-5 scratch-dig surface quality, and ion beam sputtered dielectric coating ensure long-term stability and reliable operation in high-power scientific, industrial, and OEM laser applications.

PP-UVFS-25.4-9.5-LLM134 Low Loss Ultrafast Laser Mirror

Specifications

Diameter: 25.4 mm
Thickness: 9.5 mm
Wavelength Range: 1030 – 1030 nm
Clear Aperture (CA): 20 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/6
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/8
Parallelism: 2 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.995 %
GDD R @ AOI, @ Peak Wavelength: 500 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-9.5-LLM134
FindLight SKU: FL-24450

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • Manufacturer Part Number: PP-UVFS-25.4-9.5-LLM134
  • Optimized for 1030 nm Yb:YAG, Yb:KGW and Yb:KYW laser systems
  • Ultra-high reflectivity >99.995% at 1030 nm
  • Partial reflectivity >50% at 630–660 nm for alignment beam integration
  • Ion Beam Sputtered (IBS) dielectric coating for excellent durability and long-term stability
  • Low group delay dispersion (<40 fs² over 960–1110 nm) to preserve ultrashort laser pulses
  • High laser-induced damage threshold suitable for high-power ultrafast lasers
  • UV fused silica substrate with excellent thermal and optical properties
  • 25.4 mm diameter and 9.5 mm thickness for stable optical mounting
  • Surface quality: 10-5 scratch-dig
  • Surface flatness: λ/8 @ 633 nm over a 16 mm aperture
  • Designed for normal incidence (0° AOI) applications.

Applications

  • Femtosecond laser systems
  • Picosecond laser systems
  • Yb:YAG laser amplifiers
  • Yb:KGW and Yb:KYW laser platforms
  • Industrial laser micromachining
  • Ultrafast laser beam delivery
  • Scientific spectroscopy
  • Multiphoton microscopy
  • Nonlinear optics experiments
  • Research laboratories and OEM laser equipment
  • Beam alignment and diagnostic systems using visible alignment lasers.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What makes the PP-UVFS-25.4-9.5-LLM134 suitable for ultrafast lasers?
The mirror combines extremely high reflectivity at 1030 nm, low group delay dispersion, and a high laser damage threshold, allowing ultrashort pulses to be reflected with minimal distortion while maintaining excellent optical efficiency.
Why does this mirror provide partial reflectivity at 630–660 nm?
The visible-band partial reflectivity enables the use of red alignment beams without significantly affecting the primary 1030 nm laser path. This simplifies system alignment and diagnostics in laboratory and industrial laser setups.
What laser sources is this mirror designed for?
It is optimized for 1030 nm laser systems, including Yb:YAG, Yb:KGW, and Yb:KYW ultrafast lasers commonly used in precision manufacturing, scientific research, and nonlinear optics.
What advantages does the IBS coating provide?
Ion Beam Sputtering produces dense, environmentally stable dielectric coatings with exceptionally low optical losses, superior coating durability, consistent spectral performance, and excellent resistance to high laser power.
Can this mirror be used in high-power laser applications?
Yes. The mirror is specifically designed for high-power ultrafast laser environments, offering a high laser-induced damage threshold together with excellent surface quality and optical flatness, making it suitable for demanding research and industrial systems.

Got more questions? Use the inquiry form to ask the supplier directly.

Similar Products

Add to Cart