Description

The OPTOMAN PP-UVFS-25.4-6.35-ULLM5SHL is a premium SuperHero Power ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications operating around 1030 nm. Manufactured on a high-quality UV fused silica substrate with advanced ion beam sputtered (IBS) coatings, this mirror delivers exceptional reflectivity, minimal group delay dispersion (GDD), and outstanding laser-induced damage threshold (LIDT) for reliable performance in high-peak-power laser systems.

Designed for a 45° angle of incidence, the mirror preserves ultrashort pulse integrity while providing excellent beam steering stability. The integrated stress-compensating coating enhances coating durability and optical performance, making it well suited for industrial laser processing, precision scientific research, and advanced photonics applications requiring long-term reliability under extreme operating conditions.

PP-UVFS-25.4-6.35-ULLM5SHL Ultrafast Laser Mirror 1030 nm

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 20 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-ULLM5SHL
FindLight SKU: FL-24431

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-ULLM5SHL
  • SuperHero Power series optimized for high-power ultrafast lasers
  • Designed for 1030 nm wavelength (1010–1050 nm high-reflectivity range)
  • High reflectivity exceeding 99.95% (s-polarization) and 99.9% (p-polarization) at 45°
  • Ultra-low group delay dispersion to maintain femtosecond pulse quality
  • Enhanced measured laser-induced damage threshold for both femtosecond and picosecond operation
  • Premium IBS dielectric coating for excellent environmental stability and low absorption
  • UV fused silica substrate with λ/10 surface flatness
  • Stress-compensating rear coating for improved optical stability
  • Ideal for continuous operation in high-energy ultrafast laser systems

Applications

  • Femtosecond laser beam steering
  • Picosecond laser systems
  • Yb:YAG laser platforms operating near 1030 nm
  • Ultrafast laser micromachining
  • Precision materials processing
  • Pulse compression systems
  • Optical research laboratories
  • High-power laser beam delivery
  • Nonlinear optics experiments
  • Semiconductor and precision manufacturing

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-25.4-6.35-ULLM5SHL optimized for?
This mirror is optimized for laser systems centered at 1030 nm and provides high reflectivity across the 1010–1050 nm spectral range, making it an excellent choice for Yb-based ultrafast lasers.
What makes the SuperHero Power version different from the standard model?
The SuperHero Power version offers a significantly higher measured laser-induced damage threshold while maintaining the same low-GDD optical design. This allows it to withstand higher pulse energies and peak intensities, making it suitable for the most demanding ultrafast laser applications.
Why is low group delay dispersion important?
Low GDD minimizes pulse broadening as ultrashort laser pulses reflect from the mirror. Preserving pulse duration helps maintain peak power and improves performance in precision laser processing, nonlinear optics, and ultrafast scientific experiments.
Which laser systems can use this mirror?
The mirror is compatible with many industrial and research-grade Yb:YAG ultrafast laser platforms operating near 1030 nm, including systems used for micromachining, pulse compression, beam delivery, and scientific research.
Is this mirror suitable for continuous industrial operation?
Yes. Its ion beam sputtered dielectric coating, UV fused silica substrate, stress-compensating coating, and enhanced damage threshold are designed to provide excellent durability, optical stability, and consistent performance in high-power industrial and laboratory environments.

Got more questions? Use the inquiry form to ask the supplier directly.

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