Description

The OPTOMAN PP-UVFS-25.4-6.35-ULLM31 is a premium wide-angle ultrafast laser mirror designed for demanding femtosecond laser applications operating at 515 nm. Manufactured on a high-quality UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, it delivers reflectivity exceeding 99.9% while maintaining exceptionally low group delay dispersion across a broad angle-of-incidence range from 0° to 45°. This combination makes it an excellent choice for beam steering and pulse-preserving optical systems where consistent performance over varying beam geometries is essential.

The mirror features a 25.4 mm diameter, 6.35 mm thickness, λ/8 surface flatness, and high-damage-threshold coating technology, providing excellent optical stability, durability, and long-term reliability for research laboratories, industrial laser systems, and OEM integration.

PP-UVFS-25.4-6.35-ULLM31 Wide-Angle Ultrafast Laser Mirror 515 nm

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 515 – 530 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 500 fs^2
GDD Rs @ AOI, @ Peak Wavelength: 500 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 500 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-ULLM31
FindLight SKU: FL-24433

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-ULLM31
  • Optimized for 515 nm ultrafast laser systems
  • Wide-angle operation from 0° to 45° angle of incidence
  • IBS dielectric coating for exceptional environmental stability
  • Reflectivity greater than 99.9%
  • Low group delay dispersion for minimal pulse distortion
  • UV fused silica substrate with excellent thermal stability
  • 25.4 mm diameter and 6.35 mm thickness
  • λ/8 surface flatness for high beam quality
  • High laser-induced damage threshold suitable for high-power ultrafast lasers
  • Precision optical polishing with 10-5 scratch-dig surface quality

Applications

  • Femtosecond laser systems
  • Yb:YAG second harmonic (515 nm) beam delivery
  • Ultrafast spectroscopy
  • Nonlinear optics experiments
  • Multiphoton microscopy
  • Precision laser material processing
  • Optical research laboratories
  • Pulse compression and beam steering systems
  • Scientific instrumentation
  • OEM ultrafast laser integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-25.4-6.35-ULLM31 optimized for?
This mirror is specifically optimized for high-reflectivity operation at 515 nm, making it ideal for frequency-doubled Yb:YAG ultrafast laser systems.
Why is wide-angle performance important for ultrafast laser mirrors?
A wide-angle design maintains high reflectivity and low dispersion over angles from 0° to 45°, providing greater flexibility in optical system design while preserving ultrashort pulse characteristics.
What advantages does Ion Beam Sputtering (IBS) coating provide?
IBS coatings offer dense, durable optical films with excellent environmental stability, extremely low optical losses, high reflectivity, and superior resistance to laser-induced damage compared with conventional coating methods.
Is this mirror suitable for high-power ultrafast laser applications?
Yes. Its high laser-induced damage threshold, UV fused silica substrate, and precision IBS coating make it well suited for demanding high-power femtosecond and picosecond laser systems.
Which applications benefit most from this mirror?
The mirror is ideal for ultrafast spectroscopy, nonlinear optics, beam delivery, multiphoton imaging, precision laser processing, scientific research, and OEM laser equipment requiring high reflectivity with minimal pulse distortion.

Got more questions? Use the inquiry form to ask the supplier directly.

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