Description
The OPTOMAN PP-UVFS-25.4-6.35-ULLM3 is a premium ion beam sputtered (IBS) ultrafast laser mirror engineered for high-performance femtosecond and picosecond laser systems operating at a 515 nm design wavelength. Manufactured on a precision UV fused silica substrate, this dielectric mirror delivers exceptionally high reflectivity, minimal optical losses, and excellent wavefront quality for demanding industrial, scientific, and research applications.
Designed for 45° angle of incidence, the mirror provides HRs >99.95% and HRp >99.9% across 500–530 nm, making it ideal for frequency-doubled ultrafast lasers and beam delivery systems. The precision-polished optical surface features surface flatness better than λ/8 over the clear aperture, helping preserve beam quality throughout complex optical setups. OPTOMAN's advanced IBS coating technology ensures outstanding coating durability, environmental stability, and long-term performance in high-power laser environments.
PP-UVFS-25.4-6.35-ULLM3 515 nm Ultrafast Laser Mirror
Specifications
| Diameter: | 25.4 mm |
|---|---|
| Thickness: | 6.35 mm |
| Wavelength Range: | 505 – 530 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Coated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.95 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 20 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 20 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-6.35-ULLM3 |
| FindLight SKU: | FL-24430 |
Got questions about specs? Use the inquiry form to ask.
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Features
- Manufacturer Part Number: PP-UVFS-25.4-6.35-ULLM3
- High-reflectivity dielectric mirror for 500–530 nm wavelength range
- Optimized for 515 nm ultrafast laser systems
- Reflectivity: HRs >99.95%, HRp >99.9%
- Designed for 45° angle of incidence
- Precision 25.4 mm diameter UV fused silica substrate
- 6.35 mm substrate thickness for excellent mechanical stability
- Surface flatness < λ/8 @ 633 nm over the clear aperture
- Ion Beam Sputtered (IBS) coating for superior durability and low optical losses
- Suitable for femtosecond and picosecond laser beam steering applications
Applications
- Ultrafast femtosecond laser systems
- Frequency-doubled 515 nm laser beam steering
- Precision laser micromachining
- Scientific spectroscopy
- Nonlinear optics experiments
- Semiconductor and microelectronics processing
- Optical research laboratories
- High-power laser beam delivery systems
- Laser materials processing
- Optical instrumentation and OEM laser integration
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What lasers is the PP-UVFS-25.4-6.35-ULLM3 designed for?
What is the reflectivity of this laser mirror?
Why is ion beam sputtering important for this optic?
Can this mirror be used in high-power ultrafast laser systems?
What optical setups commonly use this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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