Description

The OPTOMAN PP-UVFS-25.4-6.35-ULLM13 is a high-performance ultrafast UV laser mirror engineered for femtosecond and picosecond laser systems operating at 343 nm. Built on a premium UV fused silica substrate with a durable ion beam sputtered (IBS) dielectric coating, it delivers high reflectivity, excellent laser damage resistance, and long-term optical stability for demanding scientific and industrial applications.

Designed for operation at a 45° angle of incidence, the mirror features low group delay dispersion (GDD) to help preserve ultrashort laser pulses while minimizing optical losses. The UV fused silica substrate provides excellent transmission, low thermal expansion, and superior optical quality, ensuring reliable performance in high-power laser environments.

With its standard 25.4 mm diameter and 6.35 mm thickness, the PP-UVFS-25.4-6.35-ULLM13 integrates easily into a wide range of optical systems. It is an excellent choice for beam steering, harmonic generation, laser micromachining, spectroscopy, semiconductor processing, nonlinear optics, and advanced photonics research requiring precise and stable UV laser beam control.

PP-UVFS-25.4-6.35-ULLM13 UV Ultrafast Laser Mirror 343 nm

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 320 – 370 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 10 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.5 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.75 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 10 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-ULLM13
FindLight SKU: FL-24434

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-ULLM13
  • Optimized for 343 nm ultrafast laser wavelength
  • High-reflectivity IBS dielectric coating
  • Low group delay dispersion (GDD) for ultrashort pulse preservation
  • High laser-induced damage threshold
  • UV fused silica substrate with excellent optical quality
  • Standard 25.4 mm diameter × 6.35 mm thickness
  • Designed for 45° angle of incidence
  • Durable coating with excellent environmental stability
  • Suitable for high-power femtosecond and picosecond laser systems

Applications

  • Femtosecond UV laser systems
  • Picosecond laser beam delivery
  • Third-harmonic (343 nm) laser optics
  • Precision laser micromachining
  • Semiconductor processing
  • Scientific spectroscopy
  • Nonlinear optics experiments
  • Biomedical laser instrumentation
  • Research laboratories
  • Industrial photonics integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-25.4-6.35-ULLM13 optimized for?
The mirror is specifically optimized for 343 nm, making it ideal for third-harmonic ultrafast laser systems that require high reflectivity and excellent pulse fidelity.
Is this mirror suitable for high-power ultrafast lasers?
Yes. Its ion beam sputtered dielectric coating provides a high laser-induced damage threshold and excellent long-term stability, making it well suited for demanding femtosecond and picosecond laser applications.
How does low GDD improve laser performance?
Low group delay dispersion helps maintain the duration and shape of ultrashort laser pulses, reducing pulse distortion and improving overall system performance in precision optical applications.
What are the physical dimensions of this mirror?
The optic has a 25.4 mm (1 inch) diameter and a 6.35 mm thickness, allowing it to fit standard optical mounts used in research and industrial laser systems.
Where is this laser mirror commonly used?
This mirror is widely used in UV beam steering, harmonic generation systems, laser micromachining, spectroscopy, semiconductor manufacturing, nonlinear optics, and advanced photonics research where precise control of ultrafast laser beams is essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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