Description
The OPTOMAN PP-UVFS-25.4-6.35-ULLM11 is a high-performance UV ultrafast laser mirror designed for demanding ultraviolet laser systems operating around the 257 nm wavelengthManufactured with a UV fused silica substrate and advanced ion beam sputtered (IBS) coating technology, this mirror provides excellent reflectivity, durability, and optical precision for ultrashort pulse applications.
Featuring a 25.4 mm diameter and 6.35 mm thickness, the mirror is optimized for 45° angle-of-incidence operation with high reflectance for both s- and p-polarized UV light. Its low surface roughness, λ/10 flatness over a 15 mm area, and 10-5 scratch-dig surface quality make it suitable for precision laser applications requiring reliable beam control and minimal optical distortion.
The PP-UVFS-25.4-6.35-ULLM11 is ideal for femtosecond and picosecond laser systems, harmonic generation setups, spectroscopy instruments, and advanced research platforms where maintaining pulse quality and optical performance is critical.
PP-UVFS-25.4-6.35-ULLM11 UV Ultrafast Laser Mirror for 257 nm Applications
Specifications
| Diameter: | 25.4 mm |
|---|---|
| Thickness: | 6.35 mm |
| Wavelength Range: | 235 – 280 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/10 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 0.17 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 98.5 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 97.5 % |
| GDD Rs @ AOI, @ Peak Wavelength: | 10 fs^2 |
| GDD Rp @ AOI, @ Peak Wavelength: | 100 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-6.35-ULLM11 |
| FindLight SKU: | FL-24498 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High-reflectivity UV mirror coating optimized for 235–280 nm operation with a 257 nm design wavelength
- UV fused silica substrate provides excellent transmission characteristics, thermal stability, and resistance to UV-induced degradation
- Ion beam sputtered coating technology ensures high coating durability and consistent optical performance
- Optimized for ultrafast laser applications requiring minimized dispersion effects and preservation of short pulse characteristics
- 25.4 mm diameter and 6.35 mm thickness provide compatibility with standard optical mounts
- High surface quality of 10-5 scratch-dig and surface flatness better than λ/10 over a 15 mm area support precision beam steering.
Applications
- Ultrafast UV laser systems
- Femtosecond and picosecond pulse laser applications
- UV harmonic generation systems
- Advanced spectroscopy and nonlinear optics
- Biomedical laser instrumentation
- Precision laser micromachining and materials processing
- Research and development optical setups
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength range is the OPTOMAN PP-UVFS-25.4-6.35-ULLM11 designed for?
What type of substrate is used in this UV laser mirror?
Is this mirror suitable for ultrafast laser systems?
What are the main optical specifications of this mirror?
Which laser applications commonly use this UV mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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