Description

The OPTOMAN PP-UVFS-25.4-6.35-UBBHR7 is a high-performance broadband ultrafast laser mirror designed for near-infrared femtosecond and picosecond laser applications. Featuring an ultra-low dispersion IBS coating, this UV fused silica mirror provides exceptional reflectivity across the 980–1080 nm wavelength range while maintaining minimal Group Delay Dispersion (GDD) for precision ultrafast optics systems.

Manufactured with a 25.4 mm diameter and 6.35 mm thickness UVFS substrate, the mirror delivers excellent surface quality, dimensional stability, and optical performance at a 45° angle of incidence. The optimized broadband coating provides high s- and p-polarization reflectivity, making it suitable for demanding laser beam steering, pulse compression, and advanced photonics applications where maintaining pulse integrity is critical.

PP-UVFS-25.4-6.35-UBBHR7 Broadband Ultrafast Laser Mirror 980-1080 nm

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 980 – 1080 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/6
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 30 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 30 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-UBBHR7
FindLight SKU: FL-24499

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Features

  • High reflectivity coating with HRs >99.95% and HRp >99.9% from 980 to 1080 nm at 45° angle of incidence
  • Ultra-low Group Delay Dispersion with |GDD| below 30 fs² across optimized wavelength ranges for ultrafast pulse applications
  • Premium UV fused silica (C7980 0F) substrate offering excellent thermal stability and low optical absorption
  • Precision polished surface with 20-10 scratch-dig quality and surface flatness better than λ/6 at 633 nm over the clear aperture
  • 25.4 mm diameter design with 6.35 mm thickness, greater than 80% clear aperture, and tight parallelism control for reliable optical alignment
  • IBS (Ion Beam Sputtering) coating technology provides high durability and consistent performance in demanding laser environments.

Applications

  • Femtosecond and picosecond laser systems
  • Ultrafast laser beam delivery and steering assemblies
  • Pulse compression and dispersion-controlled optical setups
  • Near-infrared laser research and development
  • Nonlinear optics and frequency conversion experiments
  • Biomedical imaging and spectroscopy systems
  • Precision photonics laboratories and industrial laser platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the OPTOMAN PP-UVFS-25.4-6.35-UBBHR7 designed for?
The mirror is optimized for broadband operation from 980 nm to 1080 nm, making it suitable for near-infrared ultrafast laser systems operating within this spectral region.
What makes this mirror suitable for ultrafast laser applications?
This mirror is designed with an IBS broadband coating that minimizes Group Delay Dispersion, helping preserve femtosecond and picosecond pulse characteristics during beam reflection.
What substrate material is used for the PP-UVFS-25.4-6.35-UBBHR7 mirror?
The mirror uses UV fused silica (C7980 0F), a material known for excellent optical transmission, low thermal expansion, and reliable performance in precision laser applications.
At what angle of incidence is this ultrafast mirror specified?
The coating performance specifications are provided for a 45° angle of incidence, where the mirror maintains high reflectivity for both s- and p-polarized light.
What are the typical applications for this broadband ultrafast laser mirror?
This mirror is commonly used in ultrafast laser systems, optical delay lines, pulse shaping setups, spectroscopy instruments, and other photonics applications requiring high reflectivity with minimal pulse distortion.

Got more questions? Use the inquiry form to ask the supplier directly.

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