Description

The OPTOMAN PP-UVFS-25.4-6.35-MW98 is a premium ion beam sputtered (IBS) multiwavelength ultrafast laser mirror engineered for high-performance femtosecond and picosecond laser systems. Designed on a UV fused silica substrate with a 25.4 mm diameter and 6.35 mm thickness, this precision mirror provides exceptional reflectivity at 343 nm, 515 nm, and 1030 nm while maintaining excellent wavefront quality and outstanding durability.

Optimized for operation at a 45° angle of incidence, the mirror enables reliable beam steering across the fundamental, second harmonic, and third harmonic wavelengths of Yb-based ultrafast laser sources. Its high-quality optical surface, low scatter coating, and precision flatness make it an excellent choice for demanding scientific, industrial, and research laser applications requiring stable multiwavelength performance.

PP-UVFS-25.4-6.35-MW98 Multiwavelength Ultrafast Laser Mirror

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 343 – 1030 nm
Clear Aperture (CA): 22 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 10 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.8 %
GDD R @ AOI, @ Peak Wavelength: 50 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-MW98
FindLight SKU: FL-24456

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-MW98
  • Multiwavelength dielectric mirror for 343 nm, 515 nm, and 1030 nm
  • High reflectivity: >99.3% @ 343 nm, >99.5% @ 515 nm, >99.8% @ 1030 nm
  • Optimized for 45° angle of incidence
  • Premium UV fused silica (Corning 7980) substrate
  • Precision 25.4 mm diameter × 6.35 mm thickness
  • Surface flatness better than λ/8 over 20 mm aperture
  • IBS coating technology for excellent environmental stability and long service life
  • Suitable for femtosecond and picosecond ultrafast laser systems
  • Ideal for beam steering across multiple harmonic wavelengths

Applications

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-MW98
  • Multiwavelength dielectric mirror for 343 nm, 515 nm, and 1030 nm
  • High reflectivity: >99.3% @ 343 nm, >99.5% @ 515 nm, >99.8% @ 1030 nm
  • Optimized for 45° angle of incidence
  • Premium UV fused silica (Corning 7980) substrate
  • Precision 25.4 mm diameter × 6.35 mm thickness
  • Surface flatness better than λ/8 over 20 mm aperture
  • IBS coating technology for excellent environmental stability and long service life
  • Suitable for femtosecond and picosecond ultrafast laser systems
  • Ideal for beam steering across multiple harmonic wavelengths

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelengths is the PP-UVFS-25.4-6.35-MW98 designed to reflect?
This mirror is optimized for high reflectivity at three commonly used ultrafast laser wavelengths: 343 nm, 515 nm, and 1030 nm, making it suitable for systems utilizing the third, second, and fundamental harmonics of Yb-based lasers.
What type of laser systems is this mirror intended for?
It is specifically designed for femtosecond and picosecond laser systems used in scientific research, industrial micromachining, nonlinear optics, and advanced photonics applications.
Why is ion beam sputtering (IBS) beneficial for this mirror?
IBS coatings produce dense, durable optical films with excellent environmental stability, low optical losses, high laser damage resistance, and consistent long-term performance.
What is the recommended angle of incidence?
The mirror is optimized for operation at a 45° angle of incidence, ensuring the specified reflectivity across all three design wavelengths.
Can this mirror be used in harmonic generation and wavelength conversion systems?
Yes. Because it efficiently reflects 343 nm, 515 nm, and 1030 nm simultaneously, it is well suited for harmonic generation setups, beam routing, and ultrafast laser architectures where multiple wavelengths must be managed with a single optical component.

Got more questions? Use the inquiry form to ask the supplier directly.

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