Description
The OPTOMAN PP-UVFS-25.4-6.35-LLM300 is a precision ion beam sputtered (IBS) ultrafast laser mirror engineered for demanding deep-UV laser applications at 257 nm. Designed around a UV-grade fused silica substrate, it combines outstanding reflectivity, low group delay dispersion (GDD), and excellent laser-induced damage resistance to preserve pulse quality in femtosecond and picosecond laser systems.
Optimized for 45° angle of incidence, this mirror delivers greater than 99.5% reflectivity for s-polarization and greater than 99.0% for p-polarization, making it well suited for fourth-harmonic Yb:YAG ultrafast laser architectures. High surface quality, exceptional flatness, and precision manufacturing ensure minimal wavefront distortion and reliable long-term performance in industrial, scientific, and semiconductor environments.
PP-UVFS-25.4-6.35-LLM300 Ultrafast Laser Mirror
Specifications
| Diameter: | 25.4 mm |
|---|---|
| Thickness: | 6.35 mm |
| Wavelength Range: | 257 – 257 nm |
| Clear Aperture (CA): | 90 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/10 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 3 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.5 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99 % |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-6.35-LLM300 |
| FindLight SKU: | FL-24483 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-25.4-6.35-LLM300
- Optimized wavelength: 257 nm (Deep UV)
- Designed for 45° angle of incidence
- IBS high-reflectivity coating for superior optical durability
- Reflectivity: HRs >99.5%, HRp >99.0% @ 257 nm
- Low group delay dispersion for ultrashort pulse preservation
- High laser-induced damage threshold suitable for high-power ultrafast lasers
- UV-grade fused silica substrate (Corning 7980 0F)
- Diameter: 25.4 mm
- Thickness: 6.35 mm
- Surface quality: 20-10 Scratch-Dig
- Surface flatness: < λ/10 @ 633 nm over 10 mm clear aperture
- Clear aperture greater than 90%
- Uncoated rear surface for flexible system integration
- Precision manufactured for research and industrial laser systems
Applications
- Fourth-harmonic (257 nm) Yb:YAG ultrafast laser systems
- Femtosecond and picosecond laser beam steering
- Deep-UV micromachining
- Semiconductor wafer processing
- Precision laser materials processing
- Scientific spectroscopy
- Ultrafast nonlinear optics experiments
- Biomedical and pharmaceutical laser instrumentation
- Research laboratories developing UV photonics
- OEM integration into advanced ultrafast laser platforms
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the PP-UVFS-25.4-6.35-LLM300 optimized for?
Why is an IBS coating beneficial for ultrafast laser mirrors?
Can this mirror be used with femtosecond lasers?
What laser systems is this mirror compatible with?
What industries commonly use this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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