Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM198 is a premium IBS-coated ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications. Optimized for the first and second harmonics of Yb:YAG laser systems, it delivers exceptionally high reflectivity across the 500–540 nm and 1000–1070 nm wavelength ranges while maintaining extremely low group delay dispersion (GDD).

Manufactured on a precision UV fused silica substrate, this 25.4 mm diameter mirror offers excellent surface quality, high flatness, and outstanding optical stability, making it ideal for ultrafast beam steering, laser research, precision material processing, and advanced photonics systems.

PP-UVFS-25.4-6.35-LLM198 Ultrafast Laser Mirror

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 500 – 540 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 454 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/6
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 3 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.8 %
GDD Rs @ AOI, @ Peak Wavelength: 35 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 50 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM198
FindLight SKU: FL-24446

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-LLM198
  • Designed for ultrafast Yb:YAG laser systems and harmonic wavelengths
  • High-reflectivity IBS dielectric coating for superior efficiency
  • Reflectivity up to 99.9% at specified operating wavelengths
  • Ultra-low group delay dispersion to preserve ultrashort pulse quality
  • UV fused silica substrate with excellent thermal and optical stability
  • 25.4 mm diameter and 6.35 mm thickness for standard optical mounts
  • Surface flatness better than λ/6 @ 633 nm
  • High-quality 10-5 scratch-dig optical finish
  • Suitable for high-power scientific and industrial laser applications

Applications

  • Ultrafast femtosecond and picosecond laser systems
  • Yb:YAG laser beam steering and beam folding
  • Precision laser micromachining
  • Nonlinear optics and harmonic generation setups
  • Optical research laboratories
  • Spectroscopy and metrology systems
  • Industrial laser processing equipment
  • Advanced photonics and OEM laser integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What laser wavelengths is the PP-UVFS-25.4-6.35-LLM198 optimized for?
The mirror is optimized for high reflectivity in the 500–540 nm and 1000–1070 nm spectral regions, making it ideal for the first and second harmonics of Yb:YAG ultrafast laser systems.
Why is low group delay dispersion important?
Low GDD minimizes pulse broadening, allowing femtosecond and picosecond laser pulses to maintain their duration and peak intensity after reflection, which is essential for ultrafast laser performance.
What coating technology is used on this mirror?
The mirror utilizes Ion Beam Sputtered (IBS) dielectric coatings, providing exceptional reflectivity, low optical losses, excellent environmental durability, and long-term coating stability.
Can this mirror be used in high-power laser systems?
Yes. Its precision UV fused silica substrate and IBS coating make it suitable for demanding high-power ultrafast laser applications where optical stability and low absorption are critical.
What applications benefit most from this mirror?
The PP-UVFS-25.4-6.35-LLM198 is well suited for ultrafast laser research, nonlinear optics, harmonic generation, precision micromachining, spectroscopy, beam delivery, and advanced photonics instrumentation.

Got more questions? Use the inquiry form to ask the supplier directly.

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